Method and system for mask fabrication process control
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYuh-Fong Hwang, Chen-Yu Chang, Chiech-Yi Kuo, Wen-Yao Chen
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Abstract
A mask fabrication system. The mask fabrication system contains a processing tool, a metrology tool, and a controller. The processing tool processes a mask. The metrology tool inspects the mask to obtain an inspection result. The controller generates a manufacturing model of the processing tool and calibrates the manufacturing model according to a device data, a material data, and the inspection result of the mask.
Claims16
A method of fabricating a mask, comprising:
- providing material and device data;
- defining a first manufacturing model according to the material and the device data;
- performing a first process run of a first mask as defined by the first manufacturing model;
- collecting a first process data during the first process run;
- determining a backward modification data according to the material and the device data, and the first process data;
- modifying the first manufacturing model according to the backward modification data to obtain a second manufacturing model;
- and
- performing a second process run of a second mask as defined by the second manufacturing model.
A computer readable storage medium for storing a computer program providing a method for controlling mask fabrication using statistical process control analysis, the method comprising:
- receiving a material, device and first process data of a mask;
- defining a first manufacturing model according to the material and the device data;
- determining a backward modification data according to the material, the device, and the first process data;
- and
- modifying the first manufacturing model according to the backward modification data to obtain a second manufacturing model;
- and
- issuing a process command, which directs a tool to process a second mask according to the second manufacturing model.
Dependencies are inferred from the claim text.