Reticle design for minimizing thermal strain
AssigneeASML Netherlands B.V.
InventorsLowell Lane BAKER, Ksenia Sergeevna MAKARENKO, Nathan Robert FINNEY, Jacobus Cornelis Gerardus VAN DER SANDEN, James MELFI, JR., Marcus Adrianus VAN DE KERKHOF, Daniel Andreas DEENEN, Matthew LIPSON, Justin RADEMAKER
Life of this patent
Estimating the term…
Abstract
A method for reducing thermal strain in a reticle includes determining a target operating temperature of a reticle during use of the reticle, adjusting a thermal expansion (TE) property of the reticle based on the target operating temperature of the reticle, and exposing the reticle to radiation to perform a manufacturing process.
Claims15
A method comprising:
- determining a target operating temperature of a reticle during use;
- and
- adjusting a thermal expansion (TE) property of the reticle based on the target operating temperature of the reticle.
A method of manufacturing a reticle, the method comprising:
- determining a target operating temperature of the reticle during use;
- determining a desired thermal expansion (TE) property of the reticle based on the target operating temperature of the reticle;
- and
- fabricating the reticle to approximate the desired thermal expansion (TE) of the reticle.
A reticle configured for use with a lithographic apparatus, the reticle comprising a plurality of zones of the reticle, each zone of the plurality of zones of the reticle having a different ZCT.
Dependencies are inferred from the claim text.