C23C 16/50
Using electric discharges
Official title: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)}
C23C16/50 (Using electric discharges) appears on 5,432 US grants and 6,695 published applications in this corpus.
Search patents in C23C- Granted patents
- 5,432
- Published applications
- 6,695
- Assignees
- 1,535
- Inventors
- 11,467
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 3 | 0 |
| 1978 | 5 | 0 |
| 1979 | 5 | 0 |
| 1980 | 7 | 0 |
| 1981 | 17 | 0 |
| 1982 | 12 | 0 |
| 1983 | 26 | 0 |
| 1984 | 33 | 0 |
| 1985 | 31 | 0 |
| 1986 | 22 | 0 |
| 1987 | 33 | 0 |
| 1988 | 22 | 0 |
| 1989 | 43 | 0 |
| 1990 | 50 | 0 |
| 1991 | 55 | 0 |
| 1992 | 45 | 0 |
| 1993 | 68 | 0 |
| 1994 | 72 | 0 |
| 1995 | 60 | 0 |
| 1996 | 89 | 0 |
| 1997 | 86 | 0 |
| 1998 | 80 | 0 |
| 1999 | 92 | 0 |
| 2000 | 156 | 0 |
| 2001 | 114 | 64 |
| 2002 | 137 | 152 |
| 2003 | 93 | 144 |
| 2004 | 103 | 172 |
| 2005 | 79 | 162 |
| 2006 | 59 | 166 |
| 2007 | 68 | 159 |
| 2008 | 69 | 153 |
| 2009 | 64 | 214 |
| 2010 | 105 | 202 |
| 2011 | 109 | 204 |
| 2012 | 115 | 202 |
| 2013 | 123 | 217 |
| 2014 | 144 | 239 |
| 2015 | 174 | 375 |
| 2016 | 199 | 351 |
| 2017 | 231 | 383 |
| 2018 | 247 | 395 |
| 2019 | 310 | 349 |
| 2020 | 291 | 372 |
| 2021 | 258 | 360 |
| 2022 | 246 | 416 |
| 2023 | 243 | 396 |
| 2024 | 275 | 307 |
| 2025 | 291 | 340 |
| 2026 | 169 | 201 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method of manufacturing a redistribution layer, redistribution layer, integrated circuit and methods for electrically testing and protecting the integrated circuit6 Oct 2026US 12,753,493 B2STMicroelectronics S,r.l.
- Substrate processing apparatus6 Oct 2026US 12,753,507 B2Tokyo Electron Limited
- Chemical vapor deposition during additive manufacturing6 Oct 2026US 12,753,509 B2General Electric Company
- Treating silicon nitride based dielectric films6 Oct 2026US 12,757,657 B2APPLIED Materials.Inc.
- Remote plasma deposition with electrostatic clamping6 Oct 2026US 12,757,682 B2Lam Research Corporation
- Hydrophilic antimicrobial diamond coating8 Oct 2026US 2026/0308049 A1United States Department of Energy
- Fluorine-containing amorphous carbon film and method for producing same8 Oct 2026US 2026/0308753 A1Keio University
- Rf impedance matching network8 Oct 2026US 2026/0311968 A1ASM America, Inc.
- Integration of vapor deposition process into plasma etch reactor8 Oct 2026US 2026/0311972 A1Lam Research Corporation
- Method of forming protective film on outer circumferential portion including bevel portion of substrate8 Oct 2026US 2026/0311973 A1Ebara Corporation
Most cited
By later US patents
- High temperature multi-layered alloy heater assembly and related methods858US 6,035,101 AAPPLIED Materials.Inc. · 2000
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process777US 5,000,113 AAPPLIED Materials.Inc. · 1991
- Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition765US 6,942,753 B2APPLIED Materials.Inc. · 2005
- Apparatus and method for preventing the premature mixture of reactant gases in CVD and PECVD reactions763US 6,161,500 ATokyo Electron Limited · 2000