C23C 16/511
Using microwave discharges
Official title: using microwave discharges
C23C16/511 (Using microwave discharges) appears on 770 US grants and 763 published applications in this corpus.
Search patents in C23C- Granted patents
- 770
- Published applications
- 763
- Assignees
- 299
- Inventors
- 1,629
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 7 | 0 |
| 1986 | 7 | 0 |
| 1987 | 8 | 0 |
| 1988 | 8 | 0 |
| 1989 | 11 | 0 |
| 1990 | 20 | 0 |
| 1991 | 27 | 0 |
| 1992 | 12 | 0 |
| 1993 | 20 | 0 |
| 1994 | 19 | 0 |
| 1995 | 18 | 0 |
| 1996 | 23 | 0 |
| 1997 | 23 | 0 |
| 1998 | 11 | 0 |
| 1999 | 17 | 0 |
| 2000 | 32 | 0 |
| 2001 | 24 | 5 |
| 2002 | 22 | 20 |
| 2003 | 10 | 16 |
| 2004 | 11 | 17 |
| 2005 | 11 | 25 |
| 2006 | 6 | 15 |
| 2007 | 6 | 20 |
| 2008 | 5 | 17 |
| 2009 | 6 | 34 |
| 2010 | 12 | 40 |
| 2011 | 20 | 24 |
| 2012 | 18 | 32 |
| 2013 | 17 | 40 |
| 2014 | 22 | 22 |
| 2015 | 19 | 54 |
| 2016 | 19 | 27 |
| 2017 | 26 | 38 |
| 2018 | 26 | 47 |
| 2019 | 29 | 33 |
| 2020 | 30 | 34 |
| 2021 | 20 | 34 |
| 2022 | 27 | 41 |
| 2023 | 17 | 45 |
| 2024 | 37 | 29 |
| 2025 | 35 | 32 |
| 2026 | 23 | 22 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- PEALD titanium nitride with direct microwave plasma18 Aug 2026US 12,712,155 B2APPLIED Materials.Inc.
- Modular microwave plasma source9 Jun 2026US 12,651,727 B2APPLIED Materials.Inc.
- Electrode of energy storage element and manufacturing method thereof2 Jun 2026US 12,646,661 B2Industrial Technology Research Institute
- VHF broadband coaxial adapter2 Jun 2026US 12,646,685 B2Tokyo Electron Limited
- Plasma processing method26 May 2026US 12,642,019 B2Hitachi High-Tech Corporation
- Hydrophilic antimicrobial diamond coating8 Oct 2026US 2026/0308049 A1United States Department of Energy
- Microwave System for Microwave-Assisted Surface Chemistry Annealing of ALD Processes Utilizing Microwave Radiation Energy10 Sep 2026US 2026/0265912 A1MKS Inc.
- Microwave plasma cvd device27 Aug 2026US 2026/0253840 A1National Institute of Advanced Industrial Science and Technology
- Microwave plasma generating apparatus, microwave plasma processing apparatus, and microwave plasma processing method27 Aug 2026US 2026/0253841 A1Abit Technologies Co., Ltd
- In situ cleaning of deposition chamber with microwave plasma13 Aug 2026US 2026/0234792 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992
- Method and apparatus for surface treatment by plasma617US 4,579,623 AHitachi, Ltd. · 1986
- Method of high density plasma CVD gap-filling588US 6,106,678 ALam Research Corporation · 2000
- Method and apparatus for plasma optimization in water processing562US 7,017,514 B1Novellus Systems, Inc. · 2006
- Plasma process device547US 6,446,573 B2Sharp Kabushiki Kaisha · 2002