C23C 16/517
Using a combination of discharges covered by two or more of groups
Official title: using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
C23C16/517 (Using a combination of discharges covered by two or more of groups) appears on 243 US grants and 156 published applications in this corpus.
Search patents in C23C- Granted patents
- 243
- Published applications
- 156
- Assignees
- 98
- Inventors
- 565
- Latest grant
- 19 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 2 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 11 | 0 |
| 1990 | 7 | 0 |
| 1991 | 8 | 0 |
| 1992 | 5 | 0 |
| 1993 | 4 | 0 |
| 1994 | 7 | 0 |
| 1995 | 8 | 0 |
| 1996 | 7 | 0 |
| 1997 | 7 | 0 |
| 1998 | 9 | 0 |
| 1999 | 6 | 0 |
| 2000 | 18 | 0 |
| 2001 | 11 | 6 |
| 2002 | 16 | 13 |
| 2003 | 10 | 5 |
| 2004 | 8 | 6 |
| 2005 | 3 | 7 |
| 2006 | 5 | 1 |
| 2007 | 4 | 2 |
| 2008 | 3 | 3 |
| 2009 | 1 | 3 |
| 2010 | 2 | 1 |
| 2011 | 1 | 4 |
| 2012 | 1 | 5 |
| 2013 | 4 | 4 |
| 2014 | 1 | 5 |
| 2015 | 2 | 7 |
| 2016 | 4 | 3 |
| 2017 | 6 | 6 |
| 2018 | 4 | 6 |
| 2019 | 5 | 10 |
| 2020 | 4 | 8 |
| 2021 | 5 | 12 |
| 2022 | 4 | 9 |
| 2023 | 6 | 8 |
| 2024 | 9 | 10 |
| 2025 | 6 | 10 |
| 2026 | 5 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Arc-beam scanning for suppressing anode overgrowth in PICVD system19 May 2026US 12,633,502 B2Oerlikon Surface Solutions AG, PfäFfikon
- Selective deposition using differential surface charging14 Apr 2026US 12,603,249 B2Tokyo Electron Limited
- Methods and systems for depositing a layer24 Mar 2026US 12,584,221 B2ASM IP Holding B. V.
- Arc-beam position monitoring and position control in PICVD coating systems17 Mar 2026US 12,577,671 B2Oerlikon Surface Solutions AG, PfäFfikon
- Processing tool capable for forming carbon layers on substrates17 Mar 2026US 12,581,875 B2Lam Research Corporation
- Processing tool capable for forming carbon layers on substrates23 Jul 2026US 2026/0215180 A1Lam Research Corporation
- Directional selective deposition29 Jan 2026US 2026/0033257 A1APPLIED Materials.Inc.
- Method of depositing silicon nitride thin film in trench of substrate18 Sep 2025US 2025/0290198 A1ASM IP Holding B. V.
- Hybrid dual frequency plasma method and apparatus for deposition in patterned features on a substrate28 Aug 2025US 2025/0273431 A1ASM IP Holding B. V.
- Selective deposition using differential surface charging14 Aug 2025US 2025/0259824 A1Tokyo Electron Limited
Most cited
By later US patents
- Vacuum processing chamber having multi-mode access485US 6,095,083 AApplied Materiels, Inc. · 2000
- Method of depositing films using photo-CVD with chamber plasma cleaning360US 4,950,624 ASemiconductor Energy Laboratory Co.Ltd. · 1990
- CVD apparatus354US 5,427,824 ASemiconductor Energy Laboratory Co.Ltd. · 1995
- Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD320US 6,335,288 B12002
- Method for cleanup processing chamber and vacuum process module299US 4,820,377 ATexas Instruments Incorporated · 1989