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US 12,584,221 B2Granted
Methods and systems for depositing a layer
AssigneeASM IP Holding B.V.
InventorsMarko Tuominen, Viljami Pore
Life of this patent
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Abstract
Systems for depositing materials and related methods are described. The systems allow condensing or depositing a precursor on a substrate, and then curing condensed or deposited precursor to form a layer.
Claims13
A system comprising:
- a reaction chamber, the reaction chamber comprising a substrate support, the substrate support comprising a substrate cooling unit;
- a precursor source for introducing a precursor in the reaction chamber via a gas injection system fluidly coupled to the reaction chamber, the precursor source comprising a precursor source heater;
- a gas injection system heater arranged for heating the gas injection system;
- and,
- a curing unit;
- and
- a controller comprising:
- a gas injection system temperature control unit arranged to maintain the gas injection system at a pre-determined gas injection system temperature, the gas injection system temperature being higher than a precursor source temperature;
- a substrate support temperature control unit arranged to maintain the substrate support at a pre-determined substrate support temperature, the substrate support temperature being lower than the precursor source temperature;
- and
- a curing unit control unit arranged for controlling the operation of the curing unit,
- wherein the curing unit is configured to cure condensed or deposited precursor.
9 more elements
Dependencies are inferred from the claim text.