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US 12,753,509 B2Granted
Chemical vapor deposition during additive manufacturing
AssigneeGeneral Electric Company
InventorScott Alan Gold
Life of this patent
Estimating the term…
Abstract
The present disclosure generally relates to methods and apparatuses for chemical vapor deposition (CVD) during additive manufacturing (AM) processes. Such methods and apparatuses can be used to embed chemical signatures into manufactured objects, and such embedded chemical signatures may find use in anti-counterfeiting operations and in manufacture of objects with multiple materials.
Claims20
An apparatus for forming an object by additive manufacturing, comprising:
- at least one fusing source for fusing a build material;
- a recoater mechanism movable in a first dimension for spreading a layer of the build material over a build surface in a build chamber;
- and
- a chemical vapor deposition unit attached to the recoater mechanism and movable in a second dimension different from the first dimension, the chemical vapor deposition unit configured to deposit a second material during forming of the object.
1 more element
An apparatus for forming an object by additive manufacturing, comprising:
- at least one fusing source for fusing a build material at a build surface in a build chamber;
- a recoater mechanism for spreading the build material over the build surface, the recoater mechanism comprising a recoater arm moveable in a first dimension, the recoater arm comprising a rail;
- a chemical vapor deposition unit attached to the recoater arm and movable along the rail in a second dimension different from the first dimension, the chemical vapor deposition unit configured to deposit a second material during forming of the object.
An apparatus for forming an object by additive manufacturing, comprising:
- a recoater mechanism for providing a layer of powder, the recoater mechanism comprising a recoater arm for evenly spreading the layer of powder over a powder bed;
- a chemical vapor deposition unit for depositing a vapor phase chemical substance at the powder bed, wherein the chemical vapor deposition unit is attached to the recoater arm and is movable in at least two dimensions;
- and
- a fusing mechanism for selectively fusing at least a portion of the layer of powder at the powder bed.
1 more element
Dependencies are inferred from the claim text.