Substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsTatsuya Yamaguchi, Syuji Nozawa
Life of this patent
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Abstract
A substrate processing apparatus including: a processing container; a stage installed in the processing container and configured to place a substrate thereon; a ceiling plate installed at a position facing the stage in the processing container; a driver configured to raise and lower the stage; an exhaust port formed in a side wall of the processing container and configured to exhaust a gas in the processing container; and a controller configured to control conductance of a space between the exhaust port and a processing space between the stage and the ceiling plate by controlling the driver to adjust a distance between a peripheral edge portion of the stage and a facing member disposed at a position facing the peripheral edge portion in the processing container.
Claims12
A substrate processing apparatus comprising:
- a processing container;
- a stage installed in the processing container and configured to place a substrate thereon, the stage having a peripheral edge portion;
- a ceiling plate installed at a position facing the stage in the processing container;
- a driver configured to raise and lower the stage;
- an exhaust port formed in a side wall of the processing container and configured to exhaust a gas in the processing container;
- a controller configured to control an exhaust conductance of a space between the exhaust port and a processing space between the stage and the ceiling plate;
- and
- a facing member disposed at a position facing the peripheral edge portion in the processing container,
- wherein the facing member includes a second ridge that is disposed in an annular shape on a bottom surface of the ceiling plate to surround the peripheral edge portion of the stage when viewed in a direction from the ceiling plate toward the stage and protrudes in a direction from the ceiling plate toward the stage,
- wherein a gap having a predetermined distance is formed between a side surface of the second ridge and a side surface of the peripheral edge portion,
- wherein the controller is configured to control the exhaust conductance by controlling the driver to adjust a size of a region where the side surface of the second ridge and the side surface of the peripheral edge portion overlap when viewed in a direction intersecting the direction from the ceiling plate toward the stage,
- wherein a first spiral groove is formed on the side surface of the second ridge facing the side surface of the peripheral edge portion,
- wherein the peripheral edge portion includes a first ridge that is disposed in an annular shape on a peripheral edge of a top surface of the stage to surround a region in which the substrate is placed on the stage and protrudes in a direction from the stage toward the ceiling plate,
- wherein a gap having a predetermined distance is formed between a side surface of the first ridge and a side surface of the facing member, and
- wherein a second spiral groove is formed on the side surface of the first ridge facing the side surface of the facing member.
Dependencies are inferred from the claim text.