Gas distribution plate assembly for large area plasma enhanced chemical vapor deposition
AssigneeApplied Materials, Inc.
InventorsSoo Young Choi, Quanyuan Shang, Robert I. Greene, Li Hou
Life of this patent
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Abstract
Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate includes a diffuser plate having a plurality of gas passages passing between an upstream side and a downstream side of the diffuser plate. At least one of the gas passages includes a first hole and a second hole coupled by an orifice hole. The first hole extends from the upstream side of the diffuser plate while the second hole extends from the downstream side. The orifice hole has a diameter less than the respective diameters of the first and second holes.
Claims23
A gas distribution plate assembly for a processing chamber, comprising a diffuser plate having an upstream side, a downstream side, and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate, wherein at least one of the gas passages has a cylindrical hole extending from the upstream side and having a first diameter, a flared hole concentric with the cylindrical hole extending from the downstream side having a second diameter, and an orifice hole fluidly coupling the cylindrical hole and the flared hole and having a diameter less than the first and second diameters.
A gas distribution plate assembly for a processing chamber, comprising:
- a diffuser plate assembly having an upstream side and a downstream side, each of the upstream and downstream sides having a surface and a plurality of gas passages passing between the upstream and downstream sides of the diffuser plate assembly, wherein at least one of the gas passages has a cylindrical hole extending from the upstream side, an orifice hole fluidly coupled to a bottom of the cylindrical hole, and a flared second hole extending from the orifice hole to the downstream side, wherein a diameter of the orifice hole is less than the cylindrical and second holes;
- and
- a hanger plate having an inwardly extending flange defining an aperture, wherein the flange of the hanger plate is adapted to support the diffuser plate assembly.
A gas distribution plate assembly for a processing chamber, comprising:
- a polygonal diffuser plate having an upstream side and a downstream side and a plurality of gas passages passing between the upstream and downstream sides of a center region of the diffuser plate, wherein at least one of the gas passages comprises a cylindrical first hole extending from the upstream side, a flared second hole concentric with the cylindrical first hole extending from the downstream side and having a diameter at least about equal to or greater than the diameter of the first hole, and an orifice hole coupling the first and second holes and having a diameter less than the first hole;
- and
- an RF power source coupled to the diffuser plate to ignite a plasma.
Dependencies are inferred from the claim text.