C23C 16/503
Using dc or ac discharges
Official title: using DC or AC discharges
C23C16/503 (Using dc or ac discharges) appears on 221 US grants and 233 published applications in this corpus.
Search patents in C23C- Granted patents
- 221
- Published applications
- 233
- Assignees
- 163
- Inventors
- 645
- Latest grant
- 14 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 4 | 0 |
| 1984 | 4 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 4 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 3 | 0 |
| 1996 | 7 | 0 |
| 1997 | 2 | 0 |
| 1998 | 6 | 0 |
| 1999 | 4 | 0 |
| 2000 | 7 | 0 |
| 2001 | 2 | 1 |
| 2002 | 2 | 4 |
| 2003 | 2 | 9 |
| 2004 | 3 | 5 |
| 2005 | 2 | 3 |
| 2006 | 1 | 6 |
| 2007 | 3 | 1 |
| 2008 | 1 | 4 |
| 2009 | 4 | 14 |
| 2010 | 2 | 7 |
| 2011 | 1 | 15 |
| 2012 | 3 | 8 |
| 2013 | 8 | 10 |
| 2014 | 12 | 16 |
| 2015 | 18 | 17 |
| 2016 | 6 | 10 |
| 2017 | 3 | 8 |
| 2018 | 11 | 21 |
| 2019 | 17 | 5 |
| 2020 | 12 | 14 |
| 2021 | 10 | 15 |
| 2022 | 11 | 14 |
| 2023 | 8 | 5 |
| 2024 | 9 | 7 |
| 2025 | 7 | 8 |
| 2026 | 4 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Process reactor and method for producing structures on a substrate10 Sep 2026US 2026/0265911 A1
- Metal deposition using pulsed voltage27 Aug 2026US 2026/0253848 A1APPLIED Materials.Inc.
- Substrate processing method21 May 2026US 2026/0143979 A1Tokyo Electron Limited
- Mold Master Fabrication for Injection Molding Using Physical Vapor Deposition, Electroforming, and Die-Sink Discharge Machining5 Mar 2026US 2026/0061665 A1
- Dc bias dual cross feed manifold and a reactor using the same26 Feb 2026US 2026/0055505 A1ASM IP Holding B. V.
Most cited
By later US patents
- Method of high density plasma CVD gap-filling588US 6,106,678 ALam Research Corporation · 2000
- Semiconductor processing with DC assisted RF power for improved control137US 9,373,517 B2APPLIED Materials.Inc. · 2016
- Method of forming semiconducting materials and barriers124US 4,226,897 APlasma Physics Corp. · 1980
- Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films120US 5,352,493 A1994
- Diamond-like metallic nanocomposites118US 5,466,431 A1995