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US 12,644,177 B2Granted
Method for coating metal
AssigneeAgc Glass Europe
InventorsGrégory Arnoult, Eric Michel
Life of this patent
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Abstract
A metal substrate with a silicon oxide based layer having a thickness between 80 and 400 nm and having between 5 and 30 atom % of carbon. Also included is a process for depositing by PECVD a silicon oxide based layer, having a thickness comprised between 80 and 400 nm and comprising between 5 and 30 atom % of carbon, on a metal substrate.
Claims15
A metal substrate comprising:
- a metal sheet comprising aluminum and/or an aluminum alloy;
- a silicon oxide based layer having a thickness comprised between 80 and 400 nm and comprising between 5 and 30 atom % of carbon;
- and
- an anodized and subsequently sealed metal layer in between a bulk metal and the silicon oxide based layer,
- wherein the silicon oxide based layer comprises titanium oxide, zirconium oxide or a mixture of titanium oxide and zirconium oxide in an amount of greater than 0% and up to 15% by weight of the layer.
2 more elements
A metal substrate comprising:
- a metal sheet;
- a silicon oxide based layer having a thickness comprised between 80 and 400 nm and comprising between 5 and 30 atom % of carbon;
- wherein the silicon oxide based layer comprises titanium oxide, zirconium oxide or a mixture of titanium oxide and zirconium oxide in an amount of greater than 0% and up to 15% by weight of the layer.
Dependencies are inferred from the claim text.