Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated

A vacuum layer deposition apparatus comprising

• a vacuum coating chamber with an inner space;
• a material source constructed to generate electrically positively charged particles of a material to be deposited on a substrate in said inner space;
• a substrate holder with an extended metal or dielectric material surface exposed to said inner space;
• and
• a Rf plasma source comprising:
• a first electrode electrically operationally Rf-connectable or electrically operationally Rf-connected to a first tap of a Rf generator;
• a second electrode electrically operationally Rf-connectable or electrically operationally Rf-connected to a second tap of said Rf generator;
• wherein said first electrode comprising a first electrode surface of metal or of a dielectric material and is that part of an overall surface of said first electrode which is freely exposed to said inner space;
• wherein said second electrode comprising a second electrode surface of metal or of a dielectric material and is that part of an overall surface of said second electrode which is freely exposed to said inner space;
• wherein said extended surface of said substrate holder being at least a part of said first electrode surface;
• and
• wherein said second electrode surface being larger than said first electrode surface by at least a factor of 1.5.