Coatings formed from the deposition of plasma-activated adducts
AssigneesSouthwest Research Institute, Shell Oil Company
InventorsMichael A. Miller, Ronghua Wei, Gregory J. Hatton
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Abstract
A fluoro-organosiloxane composition, coating and process for depositing the coating. Substituted tetramethylenedisiloxane precursor at a flow rate (QsTMDSO) and perfluorinated propylene oxide precursor at a flow rate (QPFPO) are introduced into a process chamber at a flow rate ratio (QsTMDSO/QPFPO) in the range of 0.1 to 2.0 (g/(hr·sccm)). A pulsed DC voltage is applied to a substrate and a fluoro-organosiloxane coating is deposited on the substrate, wherein the coating exhibits a water contact angle in oil (WCA/O) of greater than 155°.
Claims8
A process for the deposition of a fluoro-organosiloxane coating, comprising:
- providing a process chamber including one or more tubular substrates and an electrode positioned in said tubular substrate;
- reducing pressure in said process chamber to a first pressure in the range of 10 mTorr to 40 mTorr;
- introducing hexamethyldisiloxane (HMDS) precursor at a flow rate in grams per hour (g/hr);
- introducing hexafluoropropylene oxide (HFPO) precursor at a flow rate in standard cubic centimeters per minute (sccm);
- setting a flow rate ratio of HMDS to HFPO at 1.25 (g/(hr-sccm));
- applying a pulsed DC voltage to said tubular substrate;
- and
- depositing a fluoro-organosiloxane coating on said tubular substrate wherein said fluoro-organosiloxane coating exhibits an average water contact angle in oil (WCA/O) of 159° to 168°.
A process for the deposition of a fluoro-organosiloxane coating, comprising:
- providing a process chamber including one or more substrates to be coated within said process chamber where said substrate is the anode or cathode of an electrical circuit;
- reducing pressure in said process chamber to a first pressure in the range of 10 mTorr to 40 mTorr;
- introducing hexamethyldisiloxane (HMDS) precursor at a flow rate in grams per hour (g/hr);
- introducing hexafluoropropylene oxide (HFPO) precursor at a flow rate in standard cubic centimeters per minute (sccm);
- setting a flow rate ratio of HMDS to HFPO at 1.25 (g/(hr-sccm));
- providing a second electrode to complete said circuit and applying a pulsed DC voltage to said substrate;
- and
- depositing a fluoro-organosiloxane coating on said substrate wherein said fluoro-organosiloxane coating exhibits an average water contact angle in oil (WCA/O) of 159° to 168°.
Dependencies are inferred from the claim text.