C23C 16/4401
Means for minimising impurities
Official title: {Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber}
C23C16/4401 (Means for minimising impurities) appears on 3,758 US grants and 5,004 published applications in this corpus.
Search patents in C23C- Granted patents
- 3,758
- Published applications
- 5,004
- Assignees
- 956
- Inventors
- 9,345
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 7 | 0 |
| 1986 | 5 | 0 |
| 1987 | 8 | 0 |
| 1988 | 2 | 0 |
| 1989 | 5 | 0 |
| 1990 | 7 | 0 |
| 1991 | 8 | 0 |
| 1992 | 14 | 0 |
| 1993 | 25 | 0 |
| 1994 | 43 | 0 |
| 1995 | 49 | 0 |
| 1996 | 66 | 0 |
| 1997 | 60 | 0 |
| 1998 | 72 | 0 |
| 1999 | 97 | 0 |
| 2000 | 138 | 0 |
| 2001 | 152 | 61 |
| 2002 | 118 | 170 |
| 2003 | 127 | 178 |
| 2004 | 137 | 200 |
| 2005 | 103 | 197 |
| 2006 | 72 | 179 |
| 2007 | 67 | 156 |
| 2008 | 54 | 176 |
| 2009 | 87 | 180 |
| 2010 | 93 | 137 |
| 2011 | 103 | 138 |
| 2012 | 100 | 139 |
| 2013 | 84 | 134 |
| 2014 | 86 | 147 |
| 2015 | 105 | 189 |
| 2016 | 100 | 175 |
| 2017 | 124 | 188 |
| 2018 | 121 | 190 |
| 2019 | 138 | 206 |
| 2020 | 153 | 215 |
| 2021 | 136 | 228 |
| 2022 | 155 | 299 |
| 2023 | 170 | 303 |
| 2024 | 208 | 271 |
| 2025 | 206 | 315 |
| 2026 | 145 | 233 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 16/4405Cleaning of reactor or parts inside the reactor by using reactive gases1,264
- C23C 16/4404Coatings or surface treatment on the inside of the reaction chamber or811
- C23C 16/4408By purging residual gases from the reaction chamber or gas lines610
- C23C 16/4409Characterised by sealing means294
- C23C 16/4402Reduction of impurities in the source gas260
- C23C 16/4407Cleaning of reactor or reactor parts by using wet or mechanical methods208
Recent patents
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Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Production of elemental thin films using a boron-containing reducing agent809US 6,475,276 B1ASM Microchemistry Oy · 2002
- Photo-assisted CVD apparatus791US 5,527,417 AKabushiki Kaisha Toshiba · 1996
- Process feed management for semiconductor substrate processing741US 9,017,481 B1ASM America, Inc. · 2015