C23C 16/4405
Cleaning of reactor or parts inside the reactor by using reactive gases
Official title: {Cleaning of reactor or parts inside the reactor by using reactive gases}
C23C16/4405 (Cleaning of reactor or parts inside the reactor by using reactive gases) appears on 1,264 US grants and 1,625 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,264
- Published applications
- 1,625
- Assignees
- 327
- Inventors
- 3,622
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 5 | 0 |
| 1993 | 13 | 0 |
| 1994 | 12 | 0 |
| 1995 | 18 | 0 |
| 1996 | 15 | 0 |
| 1997 | 28 | 0 |
| 1998 | 29 | 0 |
| 1999 | 45 | 0 |
| 2000 | 46 | 0 |
| 2001 | 69 | 28 |
| 2002 | 47 | 57 |
| 2003 | 46 | 67 |
| 2004 | 44 | 86 |
| 2005 | 38 | 84 |
| 2006 | 33 | 78 |
| 2007 | 26 | 53 |
| 2008 | 19 | 63 |
| 2009 | 35 | 68 |
| 2010 | 32 | 41 |
| 2011 | 42 | 47 |
| 2012 | 28 | 34 |
| 2013 | 22 | 51 |
| 2014 | 28 | 63 |
| 2015 | 30 | 64 |
| 2016 | 27 | 48 |
| 2017 | 43 | 48 |
| 2018 | 39 | 61 |
| 2019 | 36 | 60 |
| 2020 | 46 | 67 |
| 2021 | 38 | 65 |
| 2022 | 50 | 95 |
| 2023 | 55 | 95 |
| 2024 | 69 | 69 |
| 2025 | 47 | 74 |
| 2026 | 49 | 59 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing device and method for cleaning substrate processing device6 Oct 2026US 12,753,506 B2Jusung Engineering Co., Ltd.
- Cleaning assemblies for substrate processing chambers22 Sep 2026US 12,742,238 B2APPLIED Materials.Inc.
- Cleaning method, recording medium, and substrate processing apparatus15 Sep 2026US 12,734,561 B2Kokusai Electric Corporation
- Substrate treatment apparatus and semiconductor device manufacturing method using the same15 Sep 2026US 12,738,464 B2Samsung Electronics Co., Ltd.
- Precoat method for substrate processing apparatus and substrate processing apparatus8 Sep 2026US 12,729,433 B2Tokyo Electron Limited
- Semiconductor process system and method of cleaning the same8 Oct 2026US 2026/0308756 A1Samsung Electronics Co., Ltd.
- Reactant vapor delivery systems for semiconductor processing tools and methods8 Oct 2026US 2026/0308757 A1ASM IP Holding B. V.
- Etching of silicon carbide accretions from reactor parts1 Oct 2026US 2026/0297735 A1ASM IP Holding B. V.
- Gas supply line arrangements1 Oct 2026US 2026/0297736 A1Lam Research Corporation
- Substrate processing apparatus1 Oct 2026US 2026/0297737 A1Tokyo Electron Limited
Most cited
By later US patents
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Photo-assisted CVD apparatus791US 5,527,417 AKabushiki Kaisha Toshiba · 1996
- Deposition reactor having vaporizing, mixing and cleaning capabilities631US 6,454,860 B2APPLIED Materials.Inc. · 2002
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Remote plasma source seasoning624US 7,989,365 B2APPLIED Materials.Inc. · 2011