Semiconductor process system and method of cleaning the same
AssigneesSamsung Electronics Co., Ltd., UIF (University Industry Foundation), Yonsei University
InventorsIREH SEO, CHANG-HA LEE, Taeung YOON, RAK-YOUNG JEON
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Abstract
A semiconductor process system includes a process fluid supply, a process chamber configured to receive a process fluid from the process fluid supply, a manifold between the process fluid supply and the process chamber, a scrubber configured to purify the process fluid that is discharged from the process chamber, a vacuum pump between the process chamber and the scrubber, a cleaning gas supply connected to the manifold, and configured to provide the manifold with a cleaning gas and a bypass pipeline that connects the manifold to the scrubber and is configured to bypass the vacuum pump.
Claims20
A semiconductor process system, comprising:
- a process fluid supply;
- a process chamber configured to receive a process fluid from the process fluid supply;
- a manifold between the process fluid supply and the process chamber;
- a scrubber configured to purify the process fluid that is discharged from the process chamber;
- a vacuum pump between the process chamber and the scrubber;
- a cleaning gas supply connected to the manifold, and configured to provide the manifold with a cleaning gas;
- and
- a bypass pipeline that connects the manifold to the scrubber and is configured to bypass the vacuum pump.
A semiconductor process system, comprising:
- a process chamber;
- a manifold connected to the process chamber;
- a process fluid supply connected to the process chamber through the manifold;
- a scrubber connected to the process chamber;
- an exhaust pipeline between the scrubber and the process chamber;
- a vacuum pump on the exhaust pipeline;
- a bypass pipeline connecting the manifold to the scrubber;
- and
- a cleaning gas supply connected the manifold,
- wherein the bypass pipeline is spaced apart from the vacuum pump.
A semiconductor process system, comprising:
- a process fluid supply;
- a process chamber connected to the process fluid supply;
- a manifold between the process fluid supply and the process chamber;
- an exhaust pipeline connected to a back end of the process chamber;
- a scrubber connected to the process chamber through the exhaust pipeline;
- a vacuum pump on the exhaust pipeline;
- a cleaning gas supply connected to the manifold, and configured to provide the manifold with a cleaning gas;
- and
- a bypass pipeline connected to the scrubber and configured to bypass the vacuum pump,
- wherein the manifold comprises:
- a main pipeline connected to the process fluid supply;
- and
- a supply pipeline connecting the main pipeline and the process chamber, and
- wherein the cleaning gas supply comprises:
- a cleaning gas tank;
- and
- a connection pipeline connecting the cleaning gas tank to the supply pipeline of the manifold.
Dependencies are inferred from the claim text.