Deposition reactor having vaporizing, mixing and cleaning capabilities

An apparatus for distributing gases within a processing chamber, said apparatus comprising a gas distribution plate having a plurality of apertures, said apertures comprising:

• (a) a first cylindrical region having a first diameter coupled to an inlet surface of the gas distribution plate;
• (b) a second cylindrical region directly coupled to an outlet surface of the gas distribution plate, said second cylindrical region having a second diameter and walls having a first length;
• and
• (c) a conical region in communication with said first and second cylindrical regions, said conical region further comprising walls having a second length, wherein said walls diverge toward the outlet surface and said first length is at least 1.5 times as long as said second length.

A method of flowing gas through a gas distribution plate, said method comprising the steps of:

• (a) first flowing a gas through a first cylindrical region having a first diameter;
• followed by
• (b) flowing said gas through a conical region fluidly connected to said first cylindrical region, said conical region having diverging walls with a first length, wherein said walls diverge away from said first cylindrical region;
• followed by
• (c) flowing said gas through a second cylindrical region fluidly connected to said conical region, said second cylindrical region having a second diameter and walls of a second length, wherein said second length is at least twice as long as the length of said first length.

A method for absorbing radiation within a gas distribution plate, said method comprising the steps of:

• (a) placing a substrate in a processing apparatus having a gas distribution plate wherein said gas distribution plate includes a plurality of apertures comprising an inlet with a first cylindrical region, an outlet with a second cylindrical region having a first wall length, and a conical region located between said first and second cylindrical regions, said conical region having walls of a second wall length and opening towards said second cylindrical region, wherein said first wall length is at least twice as long as said second wall length;
• (b) generating radiation from said substrate wherein said radiation is incident to said gas distribution plate;
• and
• (c) absorbing a portion of said incident radiation in said apertures.

A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:

• (a) a first cylindrical region having a first diameter and a first length;
• (b) a second cylindrical region having a second diameter and a second length, wherein the second cylindrical region is positioned between the first cylindrical region and the outlet surface;
• and
• (c) a conical region positioned between the first and second cylindrical regions, the conical region having walls of a third length, wherein the walls diverge toward the outlet surface and the second length is at least twice as long as the third length.

A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:

• (a) a first cylindrical region directly coupled to the inlet surface, the first cylindrical region having a first diameter and a first length;
• (b) a second cylindrical region directly coupled to the outlet surface, the second cylindrical region having a second diameter and a second length;
• and
• (c) a conical region positioned between the first and second cylindrical regions, the conical region having walls of a third length, wherein the walls diverge toward the outlet surface and the second length is at least 1.5 times as long as the third length.

A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:

• (a) a first cylindrical region having a first diameter and a first length;
• (b) a second cylindrical region directly coupled to the outlet surface, the second cylindrical region having a second diameter and a second length;
• and
• (c) a conical region in communication with the first and second cylindrical regions, the conical region having walls of a third length, and wherein the walls of the conical region diverge toward the outlet surface and the second length is at least 1.5 times as long as the third length.

A gas distribution plate for distributing gases within a process chamber, the gas distribution plate comprising an inlet surface, an outlet surface, and a plurality of apertures formed between the inlet and outlet surfaces, each aperture comprising:

• (a) a first cylindrical region directly coupled to the inlet surface, the first cylindrical region having a first diameter and a first length;
• (b) a second cylindrical region directly coupled to the outlet surface, the second cylindrical region having a second diameter and a second length;
• (c) a first conical region directly coupled to the first cylindrical region;
• and
• (d) a second conical region directly coupled to the second cylindrical region, the second conical region having walls of a third length, and wherein the second length is at least 1.5 times as long as the third length.