C23C 16/4404
Coatings or surface treatment on the inside of the reaction chamber or
Official title: {Coatings or surface treatment on the inside of the reaction chamber or on parts thereof}
C23C16/4404 (Coatings or surface treatment on the inside of the reaction chamber or) appears on 811 US grants and 1,135 published applications in this corpus.
Search patents in C23C- Granted patents
- 811
- Published applications
- 1,135
- Assignees
- 299
- Inventors
- 2,500
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 2 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 2 | 0 |
| 1993 | 4 | 0 |
| 1994 | 6 | 0 |
| 1995 | 7 | 0 |
| 1996 | 13 | 0 |
| 1997 | 11 | 0 |
| 1998 | 15 | 0 |
| 1999 | 18 | 0 |
| 2000 | 22 | 0 |
| 2001 | 18 | 12 |
| 2002 | 27 | 37 |
| 2003 | 29 | 33 |
| 2004 | 26 | 42 |
| 2005 | 16 | 41 |
| 2006 | 16 | 44 |
| 2007 | 12 | 41 |
| 2008 | 16 | 51 |
| 2009 | 20 | 41 |
| 2010 | 29 | 23 |
| 2011 | 28 | 32 |
| 2012 | 31 | 38 |
| 2013 | 16 | 27 |
| 2014 | 20 | 27 |
| 2015 | 26 | 31 |
| 2016 | 17 | 41 |
| 2017 | 28 | 46 |
| 2018 | 18 | 46 |
| 2019 | 29 | 54 |
| 2020 | 37 | 60 |
| 2021 | 30 | 54 |
| 2022 | 40 | 76 |
| 2023 | 44 | 85 |
| 2024 | 49 | 63 |
| 2025 | 49 | 52 |
| 2026 | 29 | 38 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Shower head, electrode unit, gas supply unit, substrate processing apparatus, and substrate processing system6 Oct 2026US 12,753,502 B2Tokyo Electron Limited
- In situ surface coating of process chamber15 Sep 2026US 12,738,459 B2Lam Research Corporation
- Coating interior surfaces of complex bodies by atomic layer deposition25 Aug 2026US 12,716,128 B2APPLIED Materials.Inc.
- Atomic layer deposition tool and method25 Aug 2026US 12,716,129 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Rare-earth oxide based erosion resistant coatings for semiconductor application25 Aug 2026US 12,719,026 B2APPLIED Materials.Inc.
- Liner for batch semiconductor processing apparatus1 Oct 2026US 2026/0297733 A1ASM IP Holding B. V.
- Chamber-accumulation extension via in-situ passivation1 Oct 2026US 2026/0297734 A1Lam Research Corporation
- Etching of silicon carbide accretions from reactor parts1 Oct 2026US 2026/0297735 A1ASM IP Holding B. V.
- System and method for flow-through atomic layer deposition on semiconductor processing tool components1 Oct 2026US 2026/0297748 A1Entegris, Inc.
- Gas cleaning method, method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus24 Sep 2026US 2026/0284714 A1Kokusai Electric Corporation
Most cited
By later US patents
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Remote plasma source seasoning624US 7,989,365 B2APPLIED Materials.Inc. · 2011
- Method and apparatus for surface treatment by plasma617US 4,579,623 AHitachi, Ltd. · 1986
- Method and apparatus for reducing particle contamination on wafer backside during CVD process611US 6,413,321 B1APPLIED Materials.Inc. · 2002
- Surface-treated shower head for use in a substrate processing chamber584US 6,182,603 B2Applied Komatsu Technology, Inc. · 2001