Coating interior surfaces of complex bodies by atomic layer deposition

A system, comprising:

• a first processing chamber component, comprising a first exterior side, a second exterior side, opposite the first exterior side, and one or more internal channels;
• an atomic layer deposition (ALD) gas supply apparatus, wherein the ALD gas supply apparatus is affixed to inlets for the one or more internal channels of the first processing chamber component, wherein the one or more internal channels provide one or more fluid flow paths between the first exterior side of the chamber component that comprises the inlets and the second exterior side of the first processing chamber component comprising outlets of the one or more internal channels;
• an exhaust apparatus, wherein the exhaust apparatus is coupled to the outlets of the one or more internal channels, wherein the one or more internal channels of the first processing chamber component, the supply apparatus, and the exhaust apparatus define an ALD gas flow path, and wherein the ALD gas flow path does not comprise the first exterior side;
• and
• a mask disposed on at least a portion of the second exterior side, wherein at least a portion of the ALD gas flow path is formed by the mask and the exhaust apparatus.

A system, comprising:

• a first processing chamber component, comprising a first exterior side, a second exterior side, opposite the first exterior side, a third exterior side that comprises a sidewall connecting the first exterior side and the second exterior side, and one or more internal channels;
• an atomic layer deposition (ALD) gas supply apparatus, wherein the ALD gas supply apparatus is affixed to inlets for the one or more internal channels of the first processing chamber component, wherein the one or more internal channels provide one or more fluid flow paths between the first exterior side of the chamber component that comprises the inlets and the second exterior side of the first processing chamber component comprising outlets of the one or more internal channels;
• an exhaust apparatus, wherein the exhaust apparatus is coupled to the outlets of the one or more internal channels, wherein the one or more internal channels of the first processing chamber component, the supply apparatus, and the exhaust apparatus define an ALD gas flow path, and wherein the ALD gas flow path does not comprise the first exterior side;
• and
• a first seal between the exhaust apparatus and the first processing chamber component, wherein the exhaust apparatus is configured to direct the ALD gas flow path along at least a portion of the third exterior side, and wherein at least a portion of the ALD gas flow path is formed by a surface of the exhaust apparatus and the third exterior side.