C23C 16/4407
Cleaning of reactor or reactor parts by using wet or mechanical methods
Official title: {Cleaning of reactor or reactor parts by using wet or mechanical methods}
C23C16/4407 (Cleaning of reactor or reactor parts by using wet or mechanical methods) appears on 208 US grants and 247 published applications in this corpus.
Search patents in C23C- Granted patents
- 208
- Published applications
- 247
- Assignees
- 113
- Inventors
- 625
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 5 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 7 | 0 |
| 2001 | 11 | 4 |
| 2002 | 10 | 14 |
| 2003 | 10 | 12 |
| 2004 | 15 | 12 |
| 2005 | 8 | 23 |
| 2006 | 5 | 7 |
| 2007 | 6 | 9 |
| 2008 | 5 | 8 |
| 2009 | 5 | 9 |
| 2010 | 5 | 10 |
| 2011 | 7 | 10 |
| 2012 | 6 | 9 |
| 2013 | 5 | 12 |
| 2014 | 6 | 7 |
| 2015 | 5 | 6 |
| 2016 | 9 | 5 |
| 2017 | 1 | 6 |
| 2018 | 4 | 6 |
| 2019 | 3 | 9 |
| 2020 | 5 | 9 |
| 2021 | 4 | 11 |
| 2022 | 7 | 16 |
| 2023 | 11 | 7 |
| 2024 | 12 | 11 |
| 2025 | 9 | 10 |
| 2026 | 7 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Apparatus and methods for exhaust cleaning22 Sep 2026US 12,741,299 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Cleaning operations based on deposition thickness21 Jul 2026US 12,686,918 B2APPLIED Materials.Inc.
- Method of removing a by-product from a component of a semiconductor apparatus12 May 2026US 12,628,582 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Method for cleaning a vacuum system used in the manufacture of OLED devices, method for vacuum deposition on a substrate to manufacture OLED devices, and apparatus for vacuum deposition on a substrate to manufacture OLED devices10 Mar 2026US 12,571,090 B2APPLIED Materials.Inc.
- Cleaning fixture for showerhead assemblies3 Mar 2026US 12,564,871 B2ASM IP Holding B. V.
- Semiconductor cleaning apparatus and method8 Oct 2026US 2026/0307113 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method and assembly for the removal of silicon carbide from reactor parts27 Aug 2026US 2026/0250840 A1Lpe S.P.A.
- Nozzle cleaning method, crystalline oxide film formation method, and film formation apparatus6 Aug 2026US 2026/0226613 A1Shin-Etsu Chemical Co., Ltd.
- Cleaning fixture for showerhead assemblies4 Jun 2026US 2026/0151803 A1ASM IP Holding B. V.
- Film formation apparatus and maintenance method therefor22 Jan 2026US 2026/0022466 A1Tokyo Electron Limited
Most cited
By later US patents
- Methods and apparatus for cleaning deposition chamber parts using selective spray etch116US 8,691,023 B2Quantum Global Technologies, LLC · 2014
- Plasma treatment apparatus and method98US 5,698,062 ATokyo Electron Limited · 1997
- Plasma treatment method and apparatus91US 5,900,103 ATokyo Electron Limited · 1999
- Single substrate vacuum processing apparatus having improved exhaust system90US 5,582,866 AAPPLIED Materials.Inc. · 1996
- Plasma treatment method and apparatus80US 6,264,788 B1Tokyo Electron Limited · 2001