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US 12,571,090 B2Granted
Method for cleaning a vacuum system used in the manufacture of OLED devices, method for vacuum deposition on a substrate to manufacture OLED devices, and apparatus for vacuum deposition on a substrate to manufacture OLED devices
AssigneeApplied Materials, Inc.
InventorsJose Manuel Dieguez-Campo, Stefan Keller, Jae Won Lee, Takashi Anjiki, Dieter Haas
Life of this patent
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Abstract
The present disclosure provides a method for cleaning a vacuum system used in the manufacture of OLED devices. The method includes performing pre-cleaning for cleaning at least a portion of the vacuum system, and performing plasma cleaning using a remote plasma source.
Claims20
A method for cleaning a vacuum system, comprising:
- pre-cleaning a chamber of the vacuum system at a first pressure within the chamber;
- reducing the pressure within the chamber from the first pressure to a second pressure to establish a technical vacuum;
- and
- plasma cleaning the chamber using a remote plasma source, wherein plasma cleaning the chamber is performed at the second pressure within the chamber.
1 more element
A method for vacuum deposition on a substrate, comprising:
- pre-cleaning a chamber of the vacuum system at a first pressure within the chamber;
- reducing the pressure within the chamber from the first pressure to a second pressure to establish a technical vacuum;
- plasma cleaning the chamber using a remote plasma source, wherein plasma cleaning the chamber is performed at the second pressure within the chamber;
- and
- depositing one or more layers of material on a substrate.
2 more elements
An apparatus for vacuum deposition on a substrate, comprising:
- a vacuum chamber;
- a remote plasma source connected to the vacuum chamber;
- and
- a controller connected to the remote plasma source to perform a plasma cleaning as a final cleaning procedure, wherein the controller is configured to implement a method for cleaning a vacuum system, the method comprising:
- pre-cleaning a chamber of the vacuum system at a first pressure within the chamber,
- reducing the pressure within the chamber from the first pressure to a second pressure to establish a technical vacuum, and
- plasma cleaning the chamber using a remote plasma source, wherein plasma cleaning the chamber is performed at the second pressure within the chamber.
4 more elements
Dependencies are inferred from the claim text.