B81C 1/00388
Etch mask forming
Official title: {Etch mask forming}
B81C1/00388 (Etch mask forming) appears on 233 US grants and 246 published applications in this corpus.
Search patents in B81C- Granted patents
- 233
- Published applications
- 246
- Assignees
- 154
- Inventors
- 578
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 5 |
| 2002 | 3 | 11 |
| 2003 | 11 | 5 |
| 2004 | 13 | 6 |
| 2005 | 2 | 7 |
| 2006 | 5 | 3 |
| 2007 | 4 | 4 |
| 2008 | 3 | 4 |
| 2009 | 1 | 3 |
| 2010 | 2 | 7 |
| 2011 | 3 | 7 |
| 2012 | 3 | 6 |
| 2013 | 7 | 7 |
| 2014 | 10 | 13 |
| 2015 | 11 | 21 |
| 2016 | 23 | 32 |
| 2017 | 20 | 27 |
| 2018 | 20 | 9 |
| 2019 | 28 | 12 |
| 2020 | 14 | 14 |
| 2021 | 8 | 11 |
| 2022 | 11 | 9 |
| 2023 | 8 | 8 |
| 2024 | 4 | 4 |
| 2025 | 7 | 8 |
| 2026 | 5 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- B81C 1/00396Mask characterised by its composition77
- B81C 1/00404Mask characterised by its size, orientation or shape72
- B81C 1/00428Etch mask forming processes not provided for in groups b81c1/00396 - b81c1/004255
- B81C 1/00412Mask characterised by its behaviour during the etching process24
- B81C 1/0042Compensation masks in orientation dependent etching7
Recent patents
- Method of producing an etching mask, method of etching a structure into a substrate, use of a tetrel layer and structure for producing a mask26 May 2026US 12,642,059 B2JENOPTIK Optical Systems GmbH
- Process for manufacturing a microelectromechanical mirror device and microelectromechanical mirror device5 May 2026US 12,619,065 B2STMicroelectronics S,r.l.
- Method for producing at least one first and one second micromirror device10 Mar 2026US 12,570,522 B2Robert Bosch GmbH
- MEMS speaker and method of microfabrication of such a speaker20 Jan 2026US 12,528,104 B2Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Methods of fabricating porous silicon structures6 Jan 2026US 12,516,438 B2The Methodist Hospital
- Method for manufacturing a microelectromechanical system mirror device, manufacturing apparatus, set of mirror devices and wafer7 May 2026US 2026/0125262 A1Infineon Technologies AG
- Piezoelectric element, piezoelectric device, and method of manufacturing piezoelectric element12 Feb 2026US 2026/0043701 A1Denso Corporation
- Methods of fabricating porous silicon structures15 Jan 2026US 2026/0015759 A1The Methodist Hospital
- Method and system for fabricating a mems device cap11 Dec 2025US 2025/0376371 A1InvenSense, Inc.
- Optical signal redirection structure for photonics device31 Jul 2025US 2025/0244543 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method for fabricating a structure for a microelectromechanical systems (MEMS) device722US 6,794,119 B2Iridigm Display Corporation · 2004
- Method of nanoscale patterning and products made thereby250US 5,948,470 A1999
- Methods for forming openings in a substrate and apparatuses with these openings and methods for creating assemblies with openings201US 6,479,395 B1Alien Technology Corporation · 2002
- Method and apparatus for patterning fine dimensions194US 6,667,237 B1VRAM Technologies, LLC · 2003
- Micromechanical device and methods to fabricate same using hard mask resistant to structure release etch140US 8,440,523 B1International Business Machines Corporation · 2013