Method for fabricating a structure for a microelectromechanical systems (MEMS) device
AssigneeIridigm Display Corporation
InventorMark W. Miles
Life of this patent
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Abstract
The invention provides a microfabrication process which may be used to manufacture a MEMS device. The process comprises depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer; patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed; depositing a photosensitive layer over said one or a stack of layers; and passing light through said at least one aperture to expose said photosensitive layer.
Claims15
A microfabrication process for fabricating a microelectromechanical systems device, comprising:
- depositing one or a stack of layers on a substrate;
- patterning said one or a stack of layers to form a plurality of longitudinally extending groves therein;
- depositing a middle layer on said one or a stack of layers;
- patterning the middle layer using said one or a stack of layers as a photomask, wherein said middle layer is exposed to light passed through the groves in the one or a stack of layers;
- and
- developing said middle layer to form longitudinally spaced ridges in the said middle layer disposed in the groves in said one or a stack of layers, said ridges forming a support structure which is part of the microelectromechanical systems device.
A method for fabricating a microelectromechanical systems device, the method comprising:
- a) depositing one or a stack of layers on a base layer, said one layer or an uppermost layer in said stack of layers being a sacrificial layer;
- b) patterning said one or a stack of layers to provide at least one aperture therethrough through which said base layer is exposed;
- c) depositing a photosensitive layer over said one or a stack of layers;
- d) passing light through said at least one aperture to expose said photosensitive layer;
- and
- e) developing said one or a stack of layers to remove unexposed portions of said photosensitive layer and said sacrificial layer to form at least one mechanical support, each support being defined by a portion of said photosensitive layer exposed through an aperture.
Dependencies are inferred from the claim text.