B81C 1/0042
Compensation masks in orientation dependent etching
Official title: {Compensation masks in orientation dependent etching}
B81C1/0042 (Compensation masks in orientation dependent etching) appears on 7 US grants and 5 published applications in this corpus.
Search patents in B81C- Granted patents
- 7
- Published applications
- 5
- Assignees
- 5
- Inventors
- 13
- Latest grant
- 17 Nov 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 1 | 0 |
| 2015 | 0 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 1 |
| 2018 | 0 | 0 |
| 2019 | 1 | 1 |
| 2020 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method for forming a cavity and a component having a cavity17 Nov 2020US 10,840,107 B2Robert Bosch GmbH
- Method for forming a cavity and a component having a cavity1 Oct 2019US 10,431,474 B2Robert Bosch GmbH
- Method of manufacturing a structure based on anisotropic etching, and silicon substrate with etching mask19 Aug 2014US 8,809,200 B2Canon Kabushiki Kaisha
- Method of fabricating a structure by anisotropic etching, and silicon substrate with an etching mask1 Jan 2013US 8,343,368 B2Canon Kabushiki Kaisha
- Method of manufacturing a fluid injection device30 Nov 2004US 6,824,960 B2Benq Corporation
- Method for forming a cavity and a component having a cavity14 Nov 2019US 2019/0348300 A1Robert Bosch GmbH
- Method for forming a cavity and a component having a cavity18 May 2017US 2017/0140943 A1Robert Bosch GmbH
- Method of fabricating a structure by anisotropic etching, and silicon substrate with an etching mask4 Mar 2010US 2010/0053716 A1Canon Kabushiki Kaisha
- Method of manufacturing a structure based on anisotropic etching, and silicon substrate with etching mask21 May 2009US 2009/0130857 A1Canon Kabushiki Kaisha
- Method of manufacturing a fluid injection device28 Aug 2003US 2003/0160023 A1Beno Corporation
Most cited
By later US patents
- Method for producing a semiconductor6US 6,270,685 B1Denso Corporation · 2001
- Method for producing a semiconductor dynamic sensor using an anisotropic etching mask3US 6,130,010 ADenso Corporation · 2000
- Method of manufacturing a fluid injection device2US 6,824,960 B2Benq Corporation · 2004
- Method of fabricating a structure by anisotropic etching, and silicon substrate with an etching mask1US 8,343,368 B2Canon Kabushiki Kaisha · 2013