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US 5,948,470 AGranted
Method of nanoscale patterning and products made thereby
OwnerChristopher Harrison, Miri Park +4inventors
InventorsChristopher Harrison, Miri Park, Richard Register, Douglas Adamson, Paul Mansky, Paul Chaikin
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Abstract
Methods of nanometer pattern formation and transfer onto a selected substrate are provided wherein a selected block copolymer is coated onto the selected substrate and a component of the block copolymer is chemically modified or physically removed so that the dense periodic pattern of the block copolymer can be transferred onto the selected substrate. Substrates prepared by these methods are also provided.
Claims2
A method of nanometer pattern formation and transfer onto a selected substrate comprising:
- (a) selecting a block copolymer having a dense, periodic pattern with a feature size of less than 100 nm;
- (b) coating the selected block copolymer onto a selected substrate;
- (c) exposing the coated block copolymer on the selected substrate to ozone and physically removing a component of the block copolymer;
- and
- (d) transferring a pattern reflective of chemical modification and physical removal of the component of the block copolymer in step (c) onto the selected substrate.
2 more elements
Dependencies are inferred from the claim text.