Y10S 430/114
Initiator containing
Y10S430/114 (Initiator containing) appears on 2,005 US grants and 913 published applications in this corpus.
Search patents in Y10S- Granted patents
- 2,005
- Published applications
- 913
- Assignees
- 342
- Inventors
- 2,618
- Latest grant
- 4 Jun 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 31 | 0 |
| 1977 | 41 | 0 |
| 1978 | 37 | 0 |
| 1979 | 25 | 0 |
| 1980 | 21 | 0 |
| 1981 | 54 | 0 |
| 1982 | 18 | 0 |
| 1983 | 25 | 0 |
| 1984 | 31 | 0 |
| 1985 | 38 | 0 |
| 1986 | 29 | 0 |
| 1987 | 28 | 0 |
| 1988 | 33 | 0 |
| 1989 | 39 | 0 |
| 1990 | 56 | 0 |
| 1991 | 55 | 0 |
| 1992 | 36 | 0 |
| 1993 | 37 | 0 |
| 1994 | 59 | 0 |
| 1995 | 33 | 0 |
| 1996 | 34 | 0 |
| 1997 | 37 | 0 |
| 1998 | 47 | 0 |
| 1999 | 56 | 0 |
| 2000 | 78 | 0 |
| 2001 | 61 | 26 |
| 2002 | 61 | 75 |
| 2003 | 51 | 98 |
| 2004 | 90 | 95 |
| 2005 | 64 | 86 |
| 2006 | 59 | 63 |
| 2007 | 88 | 89 |
| 2008 | 62 | 85 |
| 2009 | 108 | 112 |
| 2010 | 96 | 53 |
| 2011 | 90 | 29 |
| 2012 | 64 | 39 |
| 2013 | 26 | 42 |
| 2014 | 53 | 13 |
| 2015 | 41 | 4 |
| 2016 | 7 | 3 |
| 2017 | 3 | 1 |
| 2018 | 2 | 0 |
| 2019 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
- Y10S 430/12Nitrogen compound containing690
- Y10S 430/122Sulfur compound containing682
- Y10S 430/115Cationic or anionic642
- Y10S 430/126Halogen compound containing314
- Y10S 430/117Free radical294
- Y10S 430/124Carbonyl compound containing204
- Y10S 430/116Redox or dye sensitizer154
- Y10S 430/118With inhibitor or stabilizer119
Recent patents
- Photoacid generators and lithographic resists comprising the same4 Jun 2019US 10,310,375 B2
- Chemically amplified negative resist composition and patterning process27 Mar 2018US RE46,765 E1Shin-Etsu Chemical Co., Ltd.
- Chemically amplified negative resist composition and patterning process27 Feb 2018US RE46,736 E1Shin-Etsu Chemical Co., Ltd.
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same24 Oct 2017US 9,798,235 B2FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same11 Jul 2017US 9,703,196 B2FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same7 Sep 2017US 2017/0255098 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same22 Dec 2016US 2016/0370701 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same30 Jun 2016US 2016/0187780 A1FUJIFILM Corporation
- Photoresist overcoat compositions and methods of forming electronic devices19 May 2016US 2016/0137874 A1Rohm and Haas Electronic Materials LLC
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same23 Jul 2015US 2015/0205205 A1FUJIFILM Corporation
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Partially crosslinked polymer for bilayer photoresist471US 6,811,960 B2Hyundai Electronics Industries Co., Ltd. · 2004
- Ternary photoinitiator system for addition polymerization289US 5,545,676 AMinnesota Mining and Manufacturing Company · 1996
- Energy curable compositions: two component curing agents227US 4,985,340 AMinnesota Mining and Manufacturing Company · 1991