Y10S 430/124
Carbonyl compound containing
Y10S430/124 (Carbonyl compound containing) appears on 204 US grants and 43 published applications in this corpus.
Search patents in Y10S- Granted patents
- 204
- Published applications
- 43
- Assignees
- 89
- Inventors
- 421
- Latest grant
- 21 Apr 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 8 | 0 |
| 1977 | 11 | 0 |
| 1978 | 11 | 0 |
| 1979 | 5 | 0 |
| 1980 | 6 | 0 |
| 1981 | 8 | 0 |
| 1982 | 2 | 0 |
| 1983 | 7 | 0 |
| 1984 | 4 | 0 |
| 1985 | 7 | 0 |
| 1986 | 7 | 0 |
| 1987 | 6 | 0 |
| 1988 | 3 | 0 |
| 1989 | 6 | 0 |
| 1990 | 7 | 0 |
| 1991 | 4 | 0 |
| 1992 | 7 | 0 |
| 1993 | 3 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 5 | 0 |
| 1997 | 6 | 0 |
| 1998 | 6 | 0 |
| 1999 | 5 | 0 |
| 2000 | 6 | 0 |
| 2001 | 5 | 1 |
| 2002 | 4 | 7 |
| 2003 | 4 | 4 |
| 2004 | 7 | 4 |
| 2005 | 1 | 10 |
| 2006 | 3 | 1 |
| 2007 | 6 | 2 |
| 2008 | 4 | 1 |
| 2009 | 3 | 4 |
| 2010 | 1 | 4 |
| 2011 | 5 | 1 |
| 2012 | 2 | 2 |
| 2013 | 1 | 1 |
| 2014 | 2 | 1 |
| 2015 | 3 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Resist composition, method of forming resist pattern, novel compound, and acid generator21 Apr 2015US 9,012,129 B2Tokyo Ohka Kogyo Co., Ltd.
- Sulfonium derivatives and the use therof as latent acids14 Apr 2015US 9,005,871 B2BASF SE
- Resist composition and method for producing resist pattern27 Jan 2015US 8,940,473 B2Sumitomo Chemical Company, Limited
- Radiation-sensitive resin composition and radiation-sensitive acid generating agent18 Nov 2014US 8,889,336 B2Jsr Corporation
- Resist composition, method of forming resist pattern, novel compound, and acid generator19 Aug 2014US 8,808,959 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern, novel compound, and acid generator1 May 2014US 2014/0120472 A1Tokyo Ohka Kogyo.Co., Ltd.
- Radiation-sensitive resin composition and radiation-sensitive acid generating agent3 Oct 2013US 2013/0260316 A1Jsr Corporation
- Resist composition, method of forming resist pattern, novel compound, and acid generator18 Oct 2012US 2012/0264061 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition and method for producing resist pattern30 Aug 2012US 2012/0219904 A1Sumitomo Chemical Company, Limited
- Sulfonium derivatives and the use therof as latent acids8 Dec 2011US 2011/0300484 A1BASF SE
Most cited
By later US patents
- Photopolymerizable composition185US 4,071,424 AImperial Chemical Industries PLC · 1978
- (Disulfonyl diazomethane compounds)163US 6,153,733 ADaito Chemix Corporation · 2000
- Fluorone and pyronin y derivatives126US 5,451,343 ASpectra Group Limited, Inc. · 1995
- Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere121US 5,350,660 AWako Pure Chemical Industries, Ltd. · 1994
- Photocurable epoxy-acrylate compositions107US 4,156,035 AW. R. Grace & Co. · 1979