Y10S 430/125
Carbonyl in heterocyclic compound
Y10S430/125 (Carbonyl in heterocyclic compound) appears on 52 US grants and 12 published applications in this corpus.
Search patents in Y10S- Granted patents
- 52
- Published applications
- 12
- Assignees
- 29
- Inventors
- 136
- Latest grant
- 14 Apr 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 2 | 0 |
| 1986 | 5 | 0 |
| 1987 | 3 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 1 |
| 2003 | 0 | 1 |
| 2004 | 2 | 1 |
| 2005 | 0 | 4 |
| 2006 | 0 | 0 |
| 2007 | 3 | 1 |
| 2008 | 1 | 0 |
| 2009 | 1 | 3 |
| 2010 | 0 | 0 |
| 2011 | 3 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Sulfonium derivatives and the use therof as latent acids14 Apr 2015US 9,005,871 B2BASF SE
- Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same1 Nov 2011US 8,048,613 B2Taiyo Ink Mfg. Co., Ltd.
- Positive resist composition, method of forming resist pattern, and polymeric compound20 Sep 2011US 8,021,823 B2Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator19 Apr 2011US 7,927,780 B2Tokyo Ohka Kogyo.Co., Ltd.
- Sulfonium salt photoinitiators and use thereof14 Jul 2009US 7,560,219 B2Henkel AG & Co. KGaA
- Sulfonium derivatives and the use therof as latent acids8 Dec 2011US 2011/0300484 A1BASF SE
- Positive resist composition, method of forming resist pattern, and polymeric compound27 Aug 2009US 2009/0214982 A1Tokyo Ohka Kogyo.Co., Ltd.
- Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator12 Mar 2009US 2009/0068591 A1Tokyo Ohka Kogyo.Co., Ltd.
- Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same12 Feb 2009US 2009/0038834 A1Taiyo Ink Mfg. Co., Ltd.
- Sulfonium salt photoinitiators and use thereof30 Aug 2007US 2007/0203254 A1Henkel AG & Co. KGaA
Most cited
By later US patents
- Photopolymerizable compositions featuring novel co-initiators94US 4,289,844 AEastman Kodak Company · 1981
- Radiation sensitive plates65US 5,130,227 AVickers, Incorporated · 1992
- Aminoketone sensitizers for photopolymer compositions57US 5,415,976 AMinnesota Mining and Manufacturing Company · 1995
- Visible photosensitizers for photopolymerizable compositions28US 5,236,808 AE. I. Du Pont de Nemours and Company · 1993
- Process for production of positive images using sulfonic acid precursors26US 4,618,564 ACiba-Geigy Corporation · 1986