Y10S 430/00
Radiation imagery chemistry: process, composition, or product thereof
Y10S430/00 (Radiation imagery chemistry: process, composition, or product thereof) appears on 12,979 US grants and 3,665 published applications in this corpus.
Search patents in Y10S- Granted patents
- 12,979
- Published applications
- 3,665
- Assignees
- 1,404
- Inventors
- 14,228
- Latest grant
- 23 Jan 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 181 | 0 |
| 1977 | 191 | 0 |
| 1978 | 147 | 0 |
| 1979 | 96 | 0 |
| 1980 | 172 | 0 |
| 1981 | 318 | 0 |
| 1982 | 220 | 0 |
| 1983 | 201 | 0 |
| 1984 | 228 | 0 |
| 1985 | 271 | 0 |
| 1986 | 265 | 0 |
| 1987 | 281 | 0 |
| 1988 | 311 | 0 |
| 1989 | 384 | 0 |
| 1990 | 439 | 0 |
| 1991 | 426 | 0 |
| 1992 | 337 | 0 |
| 1993 | 484 | 0 |
| 1994 | 506 | 0 |
| 1995 | 475 | 0 |
| 1996 | 433 | 0 |
| 1997 | 396 | 0 |
| 1998 | 472 | 0 |
| 1999 | 533 | 0 |
| 2000 | 570 | 0 |
| 2001 | 551 | 147 |
| 2002 | 437 | 458 |
| 2003 | 478 | 527 |
| 2004 | 468 | 456 |
| 2005 | 339 | 412 |
| 2006 | 377 | 317 |
| 2007 | 350 | 266 |
| 2008 | 276 | 267 |
| 2009 | 306 | 290 |
| 2010 | 286 | 157 |
| 2011 | 272 | 98 |
| 2012 | 194 | 99 |
| 2013 | 71 | 87 |
| 2014 | 126 | 52 |
| 2015 | 76 | 15 |
| 2016 | 17 | 5 |
| 2017 | 6 | 4 |
| 2018 | 7 | 2 |
| 2019 | 1 | 1 |
| 2020 | 1 | 2 |
| 2021 | 1 | 1 |
| 2022 | 1 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
- Y10S 430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or3,898
- Y10S 430/146Laser beam3,072
- Y10S 430/165Thermal imaging composition875
- Y10S 430/145Infrared865
- Y10S 430/143Electron beam827
- Y10S 430/156Precursor compound827
- Y10S 430/001Electric or magnetic imagery768
- Y10S 430/167X-ray683
All 36 subgroupsShow fewer
- Y10S 430/162Protective or antiabrasion layer617
- Y10S 430/151Matting or other surface reflectivity altering material587
- Y10S 430/136Coating process making radiation sensitive element425
- Y10S 430/164Rapid access processing212
- Y10S 430/163Radiation-chromic compound149
- Y10S 430/142Dye mordant143
- Y10S 430/166Toner containing137
- Y10S 430/15Lithographic emulsion130
- Y10S 430/132Anti-ultraviolet fading124
- Y10S 430/144Hydrogen peroxide treatment116
- Y10S 430/148Light sensitive titanium compound containing101
- Y10S 430/131Anticurl layer100
- Y10S 430/141Direct positive material100
- Y10S 430/153Multiple image producing on single receiver97
- Y10S 430/134Brightener containing85
- Y10S 430/137Cobalt complex containing76
- Y10S 430/147Lenticular60
- Y10S 430/14Dimensionally stable material58
- Y10S 430/155Nonresinous additive to promote interlayer adhesion in element58
- Y10S 430/138Corona discharge process38
- Y10S 430/135Cine film36
- Y10S 430/149Lippmann20
- Y10S 430/152Making camera copy12
- Y10S 430/129Aerial films or processes specifically adapted for aerial radiaion imagery10
- Y10S 430/133Binder-free emulsion9
- Y10S 430/139Defect coating7
- Y10S 430/154Neutron beam7
- Y10S 430/13Antibronze agent or process3
Recent patents
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- Perfluorinated amide salts and their uses as ionic conducting materials1 Aug 2024US 2024/0253023 A1
- Converter System17 Feb 2022US 2022/0049159 A1Seaborough IP I B.V.
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same4 Mar 2021US 2021/0066131 A1Gwangju Institute of Science and Technology
- Laser Ablation Printing26 Mar 2020US 2020/0094602 A1KYOCERA Document Solutions Inc.
- Converter System27 Feb 2020US 2020/0063031 A1Seaborough IP I B.V.
Most cited
By later US patents
- Method of controlled laser imaging of zirconia alloy ceramic lithographic member to provide localized melting in exposed areas1,100US 5,839,369 AEastman Kodak Company · 1998
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Semiconductor substrate process using a low temperature deposited carbon-containing hard mask566US 7,323,401 B2APPLIED Materials.Inc. · 2008
- Selective photoresist hardening to facilitate lateral trimming537US 6,716,571 B2Advanced Micro Devices, Inc. · 2004
- Photoresist monomers, polymers thereof and photoresist compositions containing it483US 6,514,666 B1Hyundai Electronics Industries Co., Ltd. · 2003