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US 4,491,628 AGranted
Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
AssigneeInternational Business Machines Corporation
InventorsHiroshi Ito, Carlton G. Willson, Jean M. J. Frechet
Life of this patent
Estimating the term…
Abstract
Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
Claims17
A resist composition comprising:
- a polymer and a photoinitiator which generates an acid upon exposure to radiation, the photoinitiator being present in from 1% to 100% by weight of said polymer, and the polymer having acid labile groups pendant from the polymer backbone, said groups being tertiary butyl esters of carboxylic acids or tertiary butyl carbonates of phenols, and
- said resist composition being positive working when developed with alkaline developer or polar solvent to remove exposed areas of the composition and negative working when developed with a non-polar solvent to remove unexposed areas of the composition.
Dependencies are inferred from the claim text.