Y10S 430/146
Laser beam
Y10S430/146 (Laser beam) appears on 3,072 US grants and 768 published applications in this corpus.
Search patents in Y10S- Granted patents
- 3,072
- Published applications
- 768
- Assignees
- 603
- Inventors
- 4,286
- Latest grant
- 16 Jun 2020
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 12 | 0 |
| 1977 | 10 | 0 |
| 1978 | 4 | 0 |
| 1979 | 5 | 0 |
| 1980 | 16 | 0 |
| 1981 | 30 | 0 |
| 1982 | 28 | 0 |
| 1983 | 32 | 0 |
| 1984 | 26 | 0 |
| 1985 | 46 | 0 |
| 1986 | 61 | 0 |
| 1987 | 89 | 0 |
| 1988 | 105 | 0 |
| 1989 | 101 | 0 |
| 1990 | 132 | 0 |
| 1991 | 126 | 0 |
| 1992 | 112 | 0 |
| 1993 | 149 | 0 |
| 1994 | 145 | 0 |
| 1995 | 133 | 0 |
| 1996 | 134 | 0 |
| 1997 | 120 | 0 |
| 1998 | 137 | 0 |
| 1999 | 140 | 0 |
| 2000 | 158 | 0 |
| 2001 | 171 | 44 |
| 2002 | 96 | 101 |
| 2003 | 112 | 130 |
| 2004 | 98 | 120 |
| 2005 | 85 | 105 |
| 2006 | 87 | 73 |
| 2007 | 74 | 43 |
| 2008 | 75 | 44 |
| 2009 | 64 | 45 |
| 2010 | 56 | 24 |
| 2011 | 52 | 10 |
| 2012 | 27 | 9 |
| 2013 | 7 | 10 |
| 2014 | 10 | 5 |
| 2015 | 1 | 1 |
| 2016 | 2 | 2 |
| 2017 | 2 | 1 |
| 2018 | 1 | 0 |
| 2019 | 0 | 0 |
| 2020 | 1 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Laser ablation printing16 Jun 2020US 10,682,875 B2KYOCERA Document Solutions Inc.
- Optical interposer for waveguides16 Jan 2018US 9,869,829 B2Te Connectivity Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same24 Oct 2017US 9,798,235 B2FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same11 Jul 2017US 9,703,196 B2FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same11 Oct 2016US 9,465,292 B2FUJIFILM Corporation
- Laser Ablation Printing26 Mar 2020US 2020/0094602 A1KYOCERA Document Solutions Inc.
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same7 Sep 2017US 2017/0255098 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same22 Dec 2016US 2016/0370701 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same30 Jun 2016US 2016/0187780 A1FUJIFILM Corporation
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same23 Jul 2015US 2015/0205205 A1FUJIFILM Corporation
Most cited
By later US patents
- Method of controlled laser imaging of zirconia alloy ceramic lithographic member to provide localized melting in exposed areas1,100US 5,839,369 AEastman Kodak Company · 1998
- Methods and devices for fabricating three-dimensional nanoscale structures336US 7,704,684 B2The Board of Trustees of the University of Illinois · 2010
- Grooved optical data storage device including a chalcogenide memory layer258US 4,719,594 AEnergy Conversion Devices, Inc. · 1988
- Ablation-transfer imaging/recording243US 5,171,650 AGraphics Technology International Inc. · 1992
- Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of fabricating the optical recording medium220US 6,280,684 B1Ricoh Company, Ltd. · 2001