Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
AssigneeFUJIFILM Corporation
InventorsHiromi Kobayashi, Haruki Inabe
Life of this patent
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Abstract
A method for producing a resist composition includes at least a step of filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter.
Claims16
A method for producing a resist composition, comprising:
- filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms into (D) a solvent, through a filter,
- wherein the structure of the resin (A) and the structure of the alkali soluble resin (C) are not the same.
A method for producing a resist composition, comprising:
- filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble resin having one or more fluorine atoms into (D) a solvent, through a filter,
- wherein the alkali soluble resin (C) has a group which is solubilized by hydrolyzation with an alkali developer, and
- the structure of the resin (A) and the structure of the alkali soluble resin (C) are not the same.
A method for producing a resist composition, comprising:
- filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble resin having an alkali soluble group and one or more fluorine atoms into (D) a solvent, through a filter,
- wherein the resin (A) does not have a fluorine atom, and
- the structure of the resin (A) and the structure of the alkali soluble resin (C) are not the same.
A method for producing a resist composition, comprising:
- filtering a solution obtained by dissolving (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid, (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation, and (C) an alkali soluble resin having one or more fluorine atoms into (D) a solvent through a filter,
- wherein the structure of the resin (A) and the structure of the alkali soluble resin (C) are not the same,
- the amount of the alkali soluble resin (C) is 1 to 10% by mass based on the total solid components in the resist composition, and
- the alkali soluble resin (C) contains an alkyl group having 1 to 10 carbon atoms substituted by at least one fluorine atom.
Dependencies are inferred from the claim text.