Photoacid generators and lithographic resists comprising the same

A lithographic resist comprising a photoacid generator of Formula (II):

• wherein
• R1 is selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl, —OC(O)-alkyl, —OC(O)-alkenyl, —O— alkylene-O-alkenyl, and —OH;
• R2 is selected from the group consisting of arylene, heteroarylene and polycyclic;
• R3, R4, R5 and R6 are independently selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-heteroaryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl;
• wherein the alkyl, alkenyl, alkynyl, cycloalkyl, aryl, and heteroaryl of R1 and R3-R6 are optionally and independently substituted one or more times with a substituent selected from the group consisting of -alkyl, -alkenyl, -alkynyl, cycloalkyl, -aryl, heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, -carboxyl, -hydroxyl, -halo, and -nitro;
• and
• X− is selected from the group consisting of CF3SO3−, C4F9SO3− and an anionic photoacid generator wherein the counter cation is not present;
• and
• an acid amplifier of Formula (III)
• wherein
• R1 and R2, R3, R4, R5, R6, R7, R8, R9, R10 and R12 are independently selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -fluoroalkyl, -fluoroalkenyl, -fluoroalkynyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl, —OC(O)-alkyl, —OC(O)-alkenyl, -carboxyl, -hydroxyl, -halo, -cyano and -nitro,
• wherein the alkyl, alkenyl, alkynyl, cycloalkyl, aryl and heteroaryl groups of R1-R8 are optionally and independently substituted one of more times with a substituent selected from the group consisting of -alkyl, -alkenyl, -fluoroalkyl, -fluoroalkyl, -aryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —OC(O)-alkyl, —OC(O)-alkenyl, -carboxyl, -hydroxyl, -halo, and nitro, and
• wherein the lithographic resist of Formula (II) is copolymerized with the acid amplifier of Formula (III).

A lithographic resist comprising a photoacid generator of Formula (II):

• wherein:
• R1 is selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl, —OC(O)-alkyl, —OC(O)-alkenyl, —O-alkylene-O-alkenyl, and —OH;
• R2 is selected from the group consisting of arylene, heteroarylene and polycyclic;
• R3, R4, R5 and R6 are independently selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-heteroaryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl;
• wherein the alkyl, alkenyl, alkynyl, cycloalkyl, aryl, and heteroaryl of R1 and R3-R6 are optionally and independently substituted one or more times with a substituent selected from the group consisting of -alkyl, -alkenyl, -alkynyl, cycloalkyl, -aryl, heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, -carboxyl, -hydroxyl, -halo, and -nitro;
• and
• X− is selected from the group consisting of CF3SO3−, C4F9SO3− and an anionic photoacid generator wherein the counter cation is not present;
• and
• an acid amplifier of Formula (III):
• wherein:
• R1 and R2, R3, R4, R5, R6, R7, R8, R9, R10 and R12 are independently selected from the group consisting of -hydrogen, -alkyl, -alkenyl, -alkynyl, -cycloalkyl, -fluoroalkyl, -fluoroalkenyl, -fluoroalkynyl, -aryl, -heteroaryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —O-alkylene-arylene-alkyl, —O-alkylene-arylene-alkenyl, —OC(O)-alkyl, —OC(O)-alkenyl, -carboxyl, -hydroxyl, -halo, -cyano and -nitro,
• wherein the alkyl, alkenyl, alkynyl, cycloalkyl, aryl and heteroaryl groups of R1-R8 are optionally and independently substituted one of more times with a substituent selected from the group consisting of -alkyl, -alkenyl, -fluoroalkyl, -fluoroalkyl, -aryl, —O-alkyl, —O-alkenyl, —O-aryl, —O-alkylene-aryl, —OC(O)-alkyl, —OC(O)-alkenyl, -carboxyl, -hydroxyl, -halo, and -nitro;
• and
• further comprising an energy harvesting unit, wherein the energy harvesting unit comprises a conjugated polymer.