Y10S 430/162
Protective or antiabrasion layer
Y10S430/162 (Protective or antiabrasion layer) appears on 617 US grants and 87 published applications in this corpus.
Search patents in Y10S- Granted patents
- 617
- Published applications
- 87
- Assignees
- 113
- Inventors
- 977
- Latest grant
- 4 Dec 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 6 | 0 |
| 1978 | 4 | 0 |
| 1979 | 2 | 0 |
| 1980 | 11 | 0 |
| 1981 | 40 | 0 |
| 1982 | 27 | 0 |
| 1983 | 15 | 0 |
| 1984 | 23 | 0 |
| 1985 | 22 | 0 |
| 1986 | 23 | 0 |
| 1987 | 16 | 0 |
| 1988 | 16 | 0 |
| 1989 | 20 | 0 |
| 1990 | 18 | 0 |
| 1991 | 20 | 0 |
| 1992 | 15 | 0 |
| 1993 | 13 | 0 |
| 1994 | 18 | 0 |
| 1995 | 24 | 0 |
| 1996 | 17 | 0 |
| 1997 | 18 | 0 |
| 1998 | 45 | 0 |
| 1999 | 36 | 0 |
| 2000 | 21 | 0 |
| 2001 | 25 | 6 |
| 2002 | 28 | 7 |
| 2003 | 22 | 14 |
| 2004 | 8 | 9 |
| 2005 | 7 | 14 |
| 2006 | 17 | 13 |
| 2007 | 3 | 9 |
| 2008 | 11 | 4 |
| 2009 | 3 | 1 |
| 2010 | 8 | 2 |
| 2011 | 3 | 2 |
| 2012 | 3 | 2 |
| 2013 | 0 | 0 |
| 2014 | 1 | 2 |
| 2015 | 1 | 0 |
| 2016 | 1 | 0 |
| 2017 | 1 | 1 |
| 2018 | 1 | 0 |
| 2019 | 0 | 1 |
By publication year. Applications have been published since 2001.
Recent patents
- Lithographic apparatus and device manufacturing method4 Dec 2018US 10,146,142 B2ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method28 Mar 2017US 9,606,448 B2ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method13 Sep 2016US 9,442,388 B2ASML Netherlands B. V.
- Patterning19 May 2015US 9,034,736 B2Cambridge Enterprise Limited
- Lithographic apparatus and device manufacturing method12 Aug 2014US 8,804,097 B2ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method21 Mar 2019US 2019/0086819 A1ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method8 Jun 2017US 2017/0160650 A1ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method27 Nov 2014US 2014/0347642 A1ASML Netherlands B. V.
- Lithographic apparatus and device manufacturing method13 Mar 2014US 2014/0071420 A1ASML Netherlands B. V.
- Patterning8 Nov 2012US 2012/0280216 A1Cambridge Enterprise Limited
Most cited
By later US patents
- Gradient immersion lithography220US 6,954,256 B2ASML Netherlands B. V. · 2005
- Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings144US 4,262,072 AMinnesota Mining and Manufacturing Company · 1981
- Method for producing optical member117US 5,631,107 ANippondenso Co., Ltd. · 1997
- Device manufacturing method and a substrate78US 7,326,522 B2ASML Netherlands B. V. · 2008
- Radiation-curable compositions for restorative and/or protective treatment of photographic elements76US 4,426,431 AEastman Kodak Company · 1984