Lithographic apparatus and device manufacturing method

A lithographic projection apparatus, comprising;

• a projection system configured to project a pattern from a patterning device onto a substrate, the projection system comprising an optical element through which the pattern is projected;
• an optically transmissive member between the optical element and the substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, the liquid supply system configured to provide a first liquid in the space in contact with the optical element and the member and to provide a second liquid, having a different chemical property than the first liquid, in the space in contact with the substrate and the member.

A lithographic projection apparatus, comprising:

• a projection system configured to project a pattern from a patterning device onto a substrate;
• and
• a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid,
• wherein an element of the projection system through which the pattern is to be projected and configured to be at least in part in contact with the liquid, comprises first and second separate components of CaF2, SiO2 or a combination of both materials, the components being arranged such that the projected pattern passes through the first component before passing through the second component and wherein the second component comprises a protective coating thereon.