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US 7,326,522 B2Granted
Device manufacturing method and a substrate
AssigneeASML Netherlands B.V.
InventorMarcel Mathijs Theodore Marie Dierichs
Life of this patent
Estimating the term…
Abstract
A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate.
Claims20
A device manufacturing method comprising:
- providing a liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by said substrate, said non-radiation sensitive material being at least partially transparent to radiation, being of a different material than said liquid, being provided over at least a part of a radiation sensitive layer of said substrate, and said non-radiation sensitive material having a thickness of at least 5 μm;
- and
- projecting a patterned beam of radiation, through said liquid, onto a target portion of said substrate using said projection system.
A device manufacturing method comprising:
- providing a liquid, between a substrate and at least a portion of a projection system of a lithographic projection apparatus, to a non-radiation sensitive material on said substrate, said non-radiation sensitive material, which is at least partially transparent to radiation, provided over at least a part of a radiation sensitive layer of said substrate and having a thickness effective to substantially reduce the effect of bubbles, particles, or both bubbles and particles, in said liquid on the quality of a patterned beam impinging on the radiation sensitive layer;
- and
- projecting a patterned beam of radiation, through said liquid, onto a target portion of said substrate using said projection system.
Dependencies are inferred from the claim text.