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US 8,804,097 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsErik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens
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Abstract
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
Claims20
An exposure apparatus, comprising:
- a liquid supply system configured to at least partly fill a space, adjacent a substrate table to hold a substrate, with a liquid;
- and
- a projection system to project a patterned radiation beam onto the substrate, the projection system having an optical element, the optical element having a bottom surface through which the pattern is projected and a side surface extending away from the bottom surface, wherein the bottom surface and the side surface are in contact with the liquid at least during exposure and wherein at least a part of the side surface has a protective layer,
- wherein the liquid supply system comprises a liquid confinement member having a surface extending above the bottom surface of the optical element and between which surface extending above the bottom surface of the optical element and the side surface of the optical element liquid enters at least during exposure and the liquid confinement member having a bottom surface above the substrate table, at least part of the liquid confinement member extending below the bottom surface of the optical element and above the substrate table to define an aperture through which the patterned beam and liquid passes at least during exposure and the liquid confinement member comprising an outlet, in the bottom surface of the liquid confinement member, to remove liquid.
1 more element
An exposure apparatus comprising:
- a projection system to project a patterned beam of radiation onto an object, the projection system comprising a final optical element through which the pattern passes from one side of the final optical element to the object disposed on another side of the final optical element;
- and
- a liquid supply system to at least partly fill a space between the final optical element and the object with a liquid such that the liquid contacts the object and the final optical element,
- wherein at least a surface of the final optical element through which the pattern does not pass has a protective coating to separate the portion of the final optical element covered by the coating from the liquid,
- wherein the liquid supply system comprises a liquid confinement member having a surface extending above a bottom surface of the final optical element and between which surface extending above the bottom surface of the final optical element and the surface of the final optical element liquid enters at least during exposure and the liquid confinement member having a bottom surface above the object, at least part of the liquid confinement member extending below the bottom surface of the final optical element and above the object to define an aperture through which the patterned beam and liquid passes at least during exposure and the liquid confinement member comprising an outlet, in the bottom surface of the liquid confinement member, to remove liquid.
2 more elements
A device manufacturing method, comprising:
- at least partly filling a space between an optical element of a projection system and a substrate with a liquid;
- and
- projecting a pattern from a patterning device, through the liquid, onto a substrate using the projection system, wherein the optical element has a bottom surface through which the pattern is projected and a side surface extending away from the bottom surface, wherein the bottom surface and the side surface are in contact with the liquid and wherein at least a part of the side surface has a protective layer;
- and
- at least partly confining the liquid using a liquid confinement member having a bottom surface above the substrate and having a surface extending above the bottom surface of the optical element between which surface extending above the bottom surface of the optical element and the side surface of the optical element there is liquid, wherein at least part of the liquid confinement member extends below the bottom surface of the optical element and above the substrate to define an aperture through which the patterned beam and liquid passes;
- and
- removing liquid using an outlet in the bottom surface of the liquid confinement member.
4 more elements
Dependencies are inferred from the claim text.