Y10S 430/1053
Imaging affecting physical property or radiation sensitive material, or producing nonplanar or
Official title: Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
Y10S430/1053 (Imaging affecting physical property or radiation sensitive material, or producing nonplanar or) appears on 3,898 US grants and 1,851 published applications in this corpus.
Search patents in Y10S- Granted patents
- 3,898
- Published applications
- 1,851
- Assignees
- 534
- Inventors
- 4,325
- Latest grant
- 23 Jan 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 42 | 0 |
| 1977 | 61 | 0 |
| 1978 | 48 | 0 |
| 1979 | 32 | 0 |
| 1980 | 35 | 0 |
| 1981 | 97 | 0 |
| 1982 | 37 | 0 |
| 1983 | 42 | 0 |
| 1984 | 54 | 0 |
| 1985 | 65 | 0 |
| 1986 | 58 | 0 |
| 1987 | 47 | 0 |
| 1988 | 50 | 0 |
| 1989 | 69 | 0 |
| 1990 | 98 | 0 |
| 1991 | 85 | 0 |
| 1992 | 63 | 0 |
| 1993 | 81 | 0 |
| 1994 | 106 | 0 |
| 1995 | 68 | 0 |
| 1996 | 66 | 0 |
| 1997 | 67 | 0 |
| 1998 | 91 | 0 |
| 1999 | 131 | 0 |
| 2000 | 176 | 0 |
| 2001 | 145 | 55 |
| 2002 | 129 | 189 |
| 2003 | 160 | 227 |
| 2004 | 213 | 192 |
| 2005 | 146 | 186 |
| 2006 | 151 | 147 |
| 2007 | 174 | 150 |
| 2008 | 128 | 167 |
| 2009 | 197 | 215 |
| 2010 | 173 | 107 |
| 2011 | 178 | 60 |
| 2012 | 123 | 65 |
| 2013 | 46 | 52 |
| 2014 | 85 | 25 |
| 2015 | 62 | 6 |
| 2016 | 7 | 3 |
| 2017 | 4 | 1 |
| 2018 | 4 | 0 |
| 2019 | 1 | 0 |
| 2020 | 0 | 1 |
| 2021 | 1 | 1 |
| 2022 | 1 | 1 |
| 2023 | 0 | 0 |
| 2024 | 1 | 1 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Converter system23 Jan 2024US 11,879,085 B2Seaborough IP I B.V.
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same23 Aug 2022US 11,424,163 B2Gwangju Institute of Science and Technology
- Converter system2 Nov 2021US 11,162,026 B2Seaborough IP I B.V.
- Photoacid generators and lithographic resists comprising the same4 Jun 2019US 10,310,375 B2
- Polymers and photoresist compositions29 May 2018US 9,983,477 B2Rohm and Haas Electronic Materials LLC
- Perfluorinated amide salts and their uses as ionic conducting materials1 Aug 2024US 2024/0253023 A1
- Converter System17 Feb 2022US 2022/0049159 A1Seaborough IP I B.V.
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same4 Mar 2021US 2021/0066131 A1Gwangju Institute of Science and Technology
- Converter System27 Feb 2020US 2020/0063031 A1Seaborough IP I B.V.
- Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same7 Sep 2017US 2017/0255098 A1FUJIFILM Corporation
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Photoresist monomers, polymers thereof and photoresist compositions containing it483US 6,514,666 B1Hyundai Electronics Industries Co., Ltd. · 2003
- Polymer and a forming method of a micro pattern using the same482US 6,316,162 B1Hyundai Electronics Industries Co., Ltd. · 2001
- Partially crosslinked polymer for bilayer photoresist479US 6,589,707 B2Hyundai Electronics Industries Co., Ltd. · 2003
- Method of making a semiconductor device utilizing a light-sensitive etching agent477US 3,960,559 AFuji Photo Film Co., Ltd. · 1976