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US 9,983,477 B2Granted
Polymers and photoresist compositions
AssigneeRohm and Haas Electronic Materials LLC
InventorsJames W. Thackeray, Roger A. Nassar
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Abstract
The invention relates to new polymers that comprise units that contain one or more photoacid generator groups and photoresists that contain the polymers. Preferred polymers of the invention are suitable for use in photoresists imaged at short wavelengths such as sub-250 nm or sub-200 nm, particularly 248 nm and 193 nm.
Claims18
A photoresist composition comprising:
- (i) a first polymer comprising one or more covalently linked non-ionic photoacid generator groups, wherein the first polymer comprises less than 10 mole percent aromatic groups;
- and
- (ii) second polymer that does not comprise photoacid generator groups.
A resin blend comprising:
- (i) a first polymer comprising one or more covalently linked non-ionic photoacid generator groups, wherein the first polymer comprises less than 10 mole percent aromatic groups;
- and
- (ii) a second polymer that does not comprise photoacid generator groups.
A photoresist composition comprising:
- (i) a first polymer comprising one or more covalently linked non-ionic photoacid generator groups;
- and
- (ii) a second polymer that does not comprise photoacid generator groups,
- wherein the first polymer or the second polymer comprises cyano groups.
1 more element
Dependencies are inferred from the claim text.