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  2. /Y · General tagging of new technological developments
  3. /Y10 · Technical subjects covered by former uspc
  4. /Y10S · Technical subjects covered by former uspc cross-reference art collections [xracs] and digests
  5. /Y10S 430/00 · Radiation imagery chemistry: process, composition, or product thereof
  6. /Y10S 430/133
Y10S 430/133

Binder-free emulsion

Y10S430/133 (Binder-free emulsion) appears on 9 US grants and 0 published applications in this corpus.

Search patents in Y10S

Where it sits

  1. YGeneral tagging of new technological developments
  2. Y10Technical subjects covered by former uspc
  3. Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests
  4. Y10S 430/00Radiation imagery chemistry: process, composition, or product thereof
  5. Y10S 430/133Binder-free emulsion
Granted patents
9
Published applications
0
Assignees
4
Inventors
15
Latest grant
5 Jun 2001

Filings by year

Granted patentsPublished applications
Y10S 430/133: granted patents and published applications per publication year
YearGranted patentsPublished applications
198020
198120
198240
198300
198400
198500
198600
198700
198800
198900
199000
199100
199200
199300
199400
199500
199600
199700
199800
199900
200000
200110

198019902001

By publication year. Applications have been published since 2001.

Recent patents

  • Pattern exposure method using electron beam5 Jun 2001US 6,243,487 B1NEC Corporation
  • Photosensitive element and method of preparing same28 Dec 1982US 4,366,235 APolaroid Corporation
  • Method of preparing a photosensitive silver halide element16 Nov 1982US 4,359,525 APolaroid Corporation
  • Photosensitive polyphosphate comprising Ag and Cl31 Aug 1982US 4,347,309 ACorning Glass Works
  • Archival optical recording medium27 Jul 1982US 4,341,863 ACorning Glass Works

No published applications in this class yet.

Most cited

By later US patents
  • Silver halide optical information storage media50US 4,239,338 ACorning Glass Works · 1980
  • Photosensitive element and method of preparing same26US 4,366,235 APolaroid Corporation · 1982
  • Method of preparing a photosensitive silver halide element12US 4,359,525 APolaroid Corporation · 1982
  • Pattern exposure method using electron beam9US 6,243,487 B1NEC Corporation · 2001
  • Polycrystalline tin oxide-silver chloride-cadmium chloride UV photosensitive film and method of use4US 4,275,141 ACorning Glass Works · 1981

Top assignees

Documents
  • Corning Glass Works5
  • PPolaroid Corporation2
  • Fuji Photo Film Co., Ltd.1
  • NEC Corporation1

Often classified with

  • G03CPhotosensitive materials for photographic purposes8
  • B82YSpecific uses or applications of nanostructures1
  • G03FPhotomechanical production of textured or patterned surfaces1
  • H01JElectric discharge tubes or discharge lamps1

Documents that also carry the other class.

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