Photosensitive element and method of preparing same
AssigneePolaroid Corporation
InventorEdwin H. Land
Life of this patent
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Abstract
A photosensitive element comprising a support carrying photosensitive silver halide grains in a substantially predetermined spaced array and methods for forming such photosensitive elements.
Claims102
A photosensitive element comprising a support carrying single effective photosensitive silver halide grains in a substantially predetermined, regular, geometric spaced array wherein said single effective grains are substantially free of physical contact with one another.
A method for forming a photosensitive element which comprises providing single effective silver halide grains on a substantially predetermined, regular, geometric spaced array of sites carried by a support;
- each of said sites adapted to receive a single effective silver halide grain whereby said single effective grains are substantially free of physical contact with one another.
A method for forming a photosensitive element comprising forming on a support a predetermined, regular, geometric spaced array of sites for silver halide grains and providing a single effective photosensitive silver halide grain substantially only at each of said sites and whereby said single effective grains are substantially free of physical contact with one another.
A method for forming a photosensitive silver halide element which comprises the following steps, in sequence:
- (a) exposing a photosensitive material to radiation actinic to said photosensitive material to provide a predetermined, regular, geometric exposure pattern in said photosensitive material;
- (b) developing said exposed photosensitive material to provide sites for the generation of silver halide grains;
- said sites corresponding to said predetermined pattern and said sites being spaced apart from each other;
- (c) forming a single effective photosensitive silver halide grain at each of said sites.
A method for forming a photosensitive silver halide element which comprises the following steps, in sequence:
- (a) exposing a photoresist to radiation actinic to said photoresist to provide a predetermined pattern in said photoresist;
- (b) developing the exposed photoresist to provide a relief pattern therein, said relief pattern comprising an ordered spaced array of peaks and valleys;
- and
- (c) forming single effective photosensitive silver halide grains in a spaced array corresponding to said relief pattern.
A method for forming a photosensitive silver halide element which comprises the following steps, in sequence:
- (a) exposing a substantially grainless photosensitive material to radiation actinic to said photosensitive material to provide a regular, geometric spaced pattern of exposure sites in said photosensitive material;
- (b) developing said pattern of exposure sites to provide nuclei at said sites in an array corresponding to said pattern;
- and
- (c) forming photosensitive silver halide grains on said nuclei.
Dependencies are inferred from the claim text.