Y10S 430/139
Defect coating
Y10S430/139 (Defect coating) appears on 7 US grants and 0 published applications in this corpus.
Search patents in Y10S- Granted patents
- 7
- Published applications
- 0
- Assignees
- 4
- Inventors
- 17
- Latest grant
- 27 Feb 1996
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Photoprinting on metal and similar substrates27 Feb 1996US 5,494,779 A
- Method of repairing a defect in a lithographic mask comprising metal deposition from solution via U.V. stimulated electron emission2 Mar 1993US 5,190,835 AU. S. Philips Corporation
- Mask repair system6 Mar 1990US 4,906,326 ACanon Kabushiki Kaisha
- Photomask with corrected white defects9 Apr 1985US 4,510,222 AHitachi, Ltd.
- Method and apparatus for redressing defective photomask31 Jul 1984US 4,463,073 AHitachi, Ltd.
No published applications in this class yet.
Most cited
By later US patents
- Radiation-curable compositions for restorative and/or protective treatment of photographic elements76US 4,426,431 AEastman Kodak Company · 1984
- Radiation-curable composition for restorative and/or protective treatment of photographic elements63US 4,333,998 AEastman Kodak Company · 1982
- Method and apparatus for redressing defective photomask44US 4,463,073 AHitachi, Ltd. · 1984
- Mask repair system32US 4,906,326 ACanon Kabushiki Kaisha · 1990
- Photomask with corrected white defects30US 4,510,222 AHitachi, Ltd. · 1985