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US 4,510,222 AGranted
Photomask with corrected white defects
AssigneeHitachi, Ltd.
InventorsMasaaki Okunaka, Katsuro Mizukoshi, Mikio Hongo, Tateoki Miyauchi
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Abstract
A photomask with white defects that have corrected with a film comprising a mixture of silver and tantalum oxide. The film has a good resistance to chemicals.
Claims9
A photomask with corrected white defects which comprises the white defects having been coated with a film comprising a mixture of silver and tantalum oxide to form a light-shielding film for the white defects which is sufficiently resistant to chemicals such that the photomask can be washed without dissolution of said film and which exhibits good adhesion to the photomask substrate.
Dependencies are inferred from the claim text.