US 4,906,326 A · Mask repair system

Abstract

A method and apparatus for inspecting and repairing a mask usable in the manufacture of semiconductor microcircuits, by using an electron beam is disclosed. The inspection and repair of a mask pattern are made in a single apparatus, by using a controlled current of an electron beam. For inspection, the surface of a mask having a mask pattern and a radiation-sensitive layer, covering it, is scanned with an electron beam and, by detecting secondary electrons or reflected electrons caused at that time, the state of the pattern is inspected. If any defect is detected, the portion of the radiation-sensitive layer on the detected defect is irradiated with an electron beam of greater magnitude than that for the inspection and, thereafter, the exposed portion of the radiation-sensitive layer is removed. Then, etching or plating is made to the thus uncovered portion, whereby repair of the mask pattern is made.

Claims10

Dependent claims

An apparatus for inspecting and repairing a mask, comprising:

beam producing means for producing an electron beam;
deflecting means for deflecting the electron beam from said beam producing means;
holding means for holding a mask having a mask pattern and a radiation-sensitive surface layer, said holding means holding the mask so that it can be irradiated with the electron beam deflected by said deflecting means;
adjusting means for adjusting the quantity of electron beam with which the mask held by said holding means is irradiated;
electron detecting means for detecting electrons produced when the mask is irradiated with the electron beam adjusted by said adjusting means;
holding means for holding a reference pattern data which provides a reference to the mask pattern;
defect detecting means for comparing a pattern data, corresponding to a result of detection by said electron detecting means, with the reference pattern data held by said reference pattern data holding means, to detect any defect of the mask pattern;
and
repairing means for controlling said adjusting means and said deflecting means in accordance with data corresponding to any defect detected by said defect detecting means, to repair the detected defect of the mask pattern.

6 more elements

Dependencies are inferred from the claim text.

Mask repair system

Life of this patent

Mask repair system

Life of this patent

Abstract

Claims10