Y10S 430/155
Nonresinous additive to promote interlayer adhesion in element
Y10S430/155 (Nonresinous additive to promote interlayer adhesion in element) appears on 58 US grants and 11 published applications in this corpus.
Search patents in Y10S- Granted patents
- 58
- Published applications
- 11
- Assignees
- 37
- Inventors
- 114
- Latest grant
- 1 Nov 2011
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 4 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 3 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 0 | 0 |
| 2002 | 3 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 2 |
| 2005 | 1 | 2 |
| 2006 | 1 | 4 |
| 2007 | 3 | 2 |
| 2008 | 0 | 0 |
| 2009 | 2 | 0 |
| 2010 | 1 | 0 |
| 2011 | 2 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Imaging methods1 Nov 2011US 8,048,606 B2Rohm and Haas Electronic Materials LLC
- Imaging methods12 Jul 2011US 7,977,026 B2Rohm and Haas Electronic Materials LLC
- Imaging methods6 Jul 2010US 7,749,685 B2Rohm and Haas Electronic Materials LLC
- Imaging methods10 Nov 2009US 7,615,335 B2Rohm and Haas Electronic Materials LLC
- Photoresist formulation for high aspect ratio plating21 Jul 2009US 7,563,559 B2FormFactor, Inc.
- Photoresist Formulation For High Aspect Ratio Plating25 Oct 2007US 2007/0248896 A1FormFactor, Inc.
- Imaging methods4 Jan 2007US 2007/0003865 A1Rohm and Haas Electronic Materials LLC
- Polymer composite5 Oct 2006US 2006/0222876 A1Kazunori Kataoka and Toyo Gosei Co., Ltd.
- Imaging methods5 Oct 2006US 2006/0223009 A1Rohm and Haas Electronic Materials LLC
- Imaging methods20 Jul 2006US 2006/0160024 A1Rohm and Haas Electronic Materials LLC
Most cited
By later US patents
- Laminate and method for protecting photographic element32US 4,077,830 ATapecon, Inc. · 1978
- Photographic light-sensitive materials having improved film physical properties31US 4,232,117 AFuji Photo Film Co., Ltd. · 1980
- Fabrication of holograms on plastic substrates26US 4,330,604 AHughes Aircraft Company · 1982
- Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer24US 4,698,294 AE. I. Du Pont de Nemours and Company · 1987
- Wet process for developing styrene polymer resists for submicron lithography22US 4,587,203 AHughes Aircraft Company · 1986