Photoresist formulation for high aspect ratio plating
AssigneeFormFactor, Inc.
InventorTreliant Fang
Life of this patent
Estimating the term…
Abstract
SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.
Claims30
A method of making a photoresist masking composition, the method comprising:
- providing an organic solvent;
- dissolving an octafunctional epoxidized novolac resin in the solvent to form a solution;
- adding to the solution a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, and dialkyladipates;
- adding to the solution a photopolymerization initiator;
- and
- adding to the solution an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane.
A method of making a photoresist masking composition, the method comprising:
- providing an organic solvent having a boiling point of between 160° C. and 260° C.;
- dissolving an octafunctional epoxidized novolac resin in the solvent to form a solution;
- adding to the solution a plasticizer selected from the group dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates;
- adding to the solution a photopolymerization initiator;
- and
- adding to the solution an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane.
A method of making a photoresist masking composition, the method comprising:
- providing an organic solvent comprising gamma butyrolactone;
- dissolving an octafunctional epoxidized novolac resin in the solvent to form a solution;
- adding to the solution a plasticizer selected from the group dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates;
- adding to the solution a photopolymerization initiator;
- and
- adding to the solution an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane.
A method of making a photoresist masking composition, the method comprising:
- providing 15% to 45% by weight of an organic solvent;
- dissolving an octafunctional epoxidized novolac resin in the solvent to form a solution, the resin being 50% to 75% by weight and of the formula:
- adding to the solution 0.5% to 3% by weight of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, and dialkyladipates;
- adding to the solution 3% to 7% by weight a photopolymerization initiator;
- and
- adding to the solution 1% to 6% by weight of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane.
Dependencies are inferred from the claim text.