Y10S 430/167
X-ray
Y10S430/167 (X-ray) appears on 683 US grants and 117 published applications in this corpus.
Search patents in Y10S- Granted patents
- 683
- Published applications
- 117
- Assignees
- 159
- Inventors
- 1,008
- Latest grant
- 15 Mar 2016
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 10 | 0 |
| 1977 | 14 | 0 |
| 1978 | 5 | 0 |
| 1979 | 5 | 0 |
| 1980 | 8 | 0 |
| 1981 | 20 | 0 |
| 1982 | 10 | 0 |
| 1983 | 12 | 0 |
| 1984 | 18 | 0 |
| 1985 | 22 | 0 |
| 1986 | 22 | 0 |
| 1987 | 23 | 0 |
| 1988 | 16 | 0 |
| 1989 | 25 | 0 |
| 1990 | 21 | 0 |
| 1991 | 18 | 0 |
| 1992 | 18 | 0 |
| 1993 | 20 | 0 |
| 1994 | 22 | 0 |
| 1995 | 37 | 0 |
| 1996 | 38 | 0 |
| 1997 | 21 | 0 |
| 1998 | 36 | 0 |
| 1999 | 30 | 0 |
| 2000 | 27 | 0 |
| 2001 | 24 | 3 |
| 2002 | 28 | 22 |
| 2003 | 21 | 18 |
| 2004 | 34 | 24 |
| 2005 | 19 | 19 |
| 2006 | 20 | 10 |
| 2007 | 16 | 6 |
| 2008 | 5 | 3 |
| 2009 | 3 | 7 |
| 2010 | 4 | 1 |
| 2011 | 6 | 1 |
| 2012 | 1 | 1 |
| 2013 | 1 | 0 |
| 2014 | 0 | 1 |
| 2015 | 2 | 1 |
| 2016 | 1 | 0 |
By publication year. Applications have been published since 2001.
Subgroups
Granted patents
Recent patents
- Pre-patterned hard mask for ultrafast lithographic imaging15 Mar 2016US 9,285,682 B2Intel Corporation
- Drug development and manufacturing13 Oct 2015US 9,157,875 B2
- Pre-patterned hard mask for ultrafast lithographic imaging14 Apr 2015US 9,005,875 B2Intel Corporation
- Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same20 Aug 2013US 8,513,457 B2Central Glass Company, Limited
- Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same29 May 2012US 8,187,787 B2Central Glass Company, Limited
- Pre-patterned hard mask for ultrafast lithographic imaging10 Sep 2015US 2015/0253667 A1Intel Corporation
- Pre-patterned hard mask for ultrafast lithographic imaging18 Sep 2014US 2014/0272711 A1Intel Corporation
- Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same6 Sep 2012US 2012/0226070 A1Central Glass Company, Limited
- Method and system for correction of fluoroscope image distortion19 May 2011US 2011/0116693 A1General Electric Company
- Industrial x-ray photosensitive material14 Jan 2010US 2010/0009300 A1FUJIFILM Corporation
Most cited
By later US patents
- Process for reducing edge roughness in patterned photoresist182US 6,709,807 B2Axcelis Technologies, Inc. · 2004
- Method of forming a personal information card167US 4,692,394 ADrexler Technology Corporation · 1987
- Formation of microstructures using a preformed photoresist sheet144US 5,378,583 AWisconsin Alumni Research Foundation · 1995
- Micromachined differential pressure transducers97US 5,357,807 AWisconsin Alumni Research Foundation · 1994
- Structure with a silicon body having through openings88US 4,393,127 AInternational Business Machines Corporation · 1983