Y10S 430/168
X-ray exposure process
Y10S430/168 (X-ray exposure process) appears on 362 US grants and 60 published applications in this corpus.
Search patents in Y10S- Granted patents
- 362
- Published applications
- 60
- Assignees
- 125
- Inventors
- 634
- Latest grant
- 15 Mar 2016
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 6 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 4 | 0 |
| 1981 | 15 | 0 |
| 1982 | 5 | 0 |
| 1983 | 8 | 0 |
| 1984 | 11 | 0 |
| 1985 | 14 | 0 |
| 1986 | 13 | 0 |
| 1987 | 14 | 0 |
| 1988 | 8 | 0 |
| 1989 | 14 | 0 |
| 1990 | 14 | 0 |
| 1991 | 10 | 0 |
| 1992 | 8 | 0 |
| 1993 | 8 | 0 |
| 1994 | 14 | 0 |
| 1995 | 18 | 0 |
| 1996 | 25 | 0 |
| 1997 | 9 | 0 |
| 1998 | 11 | 0 |
| 1999 | 6 | 0 |
| 2000 | 15 | 0 |
| 2001 | 15 | 3 |
| 2002 | 20 | 11 |
| 2003 | 13 | 13 |
| 2004 | 23 | 8 |
| 2005 | 8 | 8 |
| 2006 | 10 | 6 |
| 2007 | 9 | 4 |
| 2008 | 4 | 2 |
| 2009 | 0 | 2 |
| 2010 | 1 | 0 |
| 2011 | 2 | 1 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 1 |
| 2015 | 1 | 1 |
| 2016 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Pre-patterned hard mask for ultrafast lithographic imaging15 Mar 2016US 9,285,682 B2Intel Corporation
- Pre-patterned hard mask for ultrafast lithographic imaging14 Apr 2015US 9,005,875 B2Intel Corporation
- Method and system for correction of fluoroscope image distortion26 Jul 2011US 7,986,826 B2General Electric Company
- Method and system for correction of fluoroscope image distortion7 Jun 2011US 7,957,582 B2General Electric Company
- Functionalized carbosilane polymers and photoresist compositions containing the same2 Nov 2010US 7,824,845 B2International Business Machines Corporation
- Pre-patterned hard mask for ultrafast lithographic imaging10 Sep 2015US 2015/0253667 A1Intel Corporation
- Pre-patterned hard mask for ultrafast lithographic imaging18 Sep 2014US 2014/0272711 A1Intel Corporation
- Method and system for correction of fluoroscope image distortion19 May 2011US 2011/0116693 A1General Electric Company
- Functionalized carbosilane polymers and photoresist compositions containing the same26 Mar 2009US 2009/0081597 A1International Business Machines Corporation
- Functionalized carbosilane polymers and photoresist compositions containing the same26 Mar 2009US 2009/0081598 A1International Business Machines Corporation
Most cited
By later US patents
- Process for reducing edge roughness in patterned photoresist182US 6,709,807 B2Axcelis Technologies, Inc. · 2004
- Formation of microstructures using a preformed photoresist sheet144US 5,378,583 AWisconsin Alumni Research Foundation · 1995
- Micromachined differential pressure transducers97US 5,357,807 AWisconsin Alumni Research Foundation · 1994
- Structure with a silicon body having through openings88US 4,393,127 AInternational Business Machines Corporation · 1983
- Formation of microstructures using a preformed photoresist sheet80US 5,576,147 AWisconsin Alumni Research Foundation · 1996