Functionalized carbosilane polymers and photoresist compositions containing the same
AssigneeInternational Business Machines Corporation
InventorsRobert D. Allen, Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong
Life of this patent
Estimating the term…
Abstract
Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
Claims13
A process for generating a resist image on a substrate, comprising:
- coating a substrate with a film comprising a photoresist composition comprising a functionalized carbosilane polymer having at least one acid labile functionality and/or an aqueous base soluble functionality, wherein the functionalized polycarbosilane has a formula selected from the group consisting of:
- wherein a, b, and c are integers that represent a number of repeat units;
- exposing the film selectively to a predetermined pattern of radiation so as to form a latent patterned image in the film;
- and
- developing the latent image with a developer to form the resist image.
A process for forming a multilayer structure, comprising:
- forming a first layer of a planarizing material on a substrate;
- forming a second layer of a resist material on the first layer, wherein the resist layer comprises a functionalized carbosilane polymer having at least one acid labile functionality and/or an aqueous base soluble functionality, wherein the functionalized polycarbosilane has a formula selected from the group consisting of:
- wherein a, b, and c are integers that represent a number of repeat units;
- pattern-wise exposing the second layer to radiation using a patterning tool;
- and
- developing a pattern in the second layer to remove unexposed portions of the second layer and to form a patterned resist that reveals portions of the first layer.
A process for generating a resist image on a substrate, comprising:
- coating a substrate with a film comprising a photoresist composition comprising a functionalized carbosilane polymer having at least one acid labile functionality and/or an aqueous base soluble functionality, wherein the functionalized polycarbosilane has a refractive index greater than 1.7 and an absorbance less than 3.0 μm−1 at 193 nanometers and has a formula selected from the group consisting of:
- wherein a, b, and c are integers that represent a number of repeat units;
- providing a liquid medium between the film and a lens of an exposure tool;
- exposing the film selectively to a predetermined pattern of radiation so as to form a latent patterned image in the film;
- and
- developing the latent image with a developer to form the resist image.
Dependencies are inferred from the claim text.