Y10S 430/15
Lithographic emulsion
Y10S430/15 (Lithographic emulsion) appears on 130 US grants and 8 published applications in this corpus.
Search patents in Y10S- Granted patents
- 130
- Published applications
- 8
- Assignees
- 25
- Inventors
- 193
- Latest grant
- 18 May 2010
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 5 | 0 |
| 1977 | 11 | 0 |
| 1978 | 3 | 0 |
| 1979 | 3 | 0 |
| 1980 | 10 | 0 |
| 1981 | 9 | 0 |
| 1982 | 10 | 0 |
| 1983 | 2 | 0 |
| 1984 | 4 | 0 |
| 1985 | 4 | 0 |
| 1986 | 3 | 0 |
| 1987 | 6 | 0 |
| 1988 | 12 | 0 |
| 1989 | 14 | 0 |
| 1990 | 12 | 0 |
| 1991 | 3 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 1 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 1 |
| 2002 | 2 | 5 |
| 2003 | 4 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 0 | 1 |
| 2010 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Method for forming photoresist layer18 May 2010US 7,718,551 B2United Microelectronics Corp.
- Semiconductive substrate processing methods and methods of processing a semiconductive substrate27 Jan 2004US 6,682,873 B2Micron Technology, Inc.
- Mask forming methods and a field emission display emitter mask forming method1 Jul 2003US 6,586,144 B2Micron Technology, Inc.
- Structures and structure forming methods3 Jun 2003US 6,573,023 B2Micron Technology, Inc.
- Structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters25 Mar 2003US 6,537,728 B2Micron Technology, Inc.
- Method for forming photoresist layer10 Sep 2009US 2009/0227120 A1United Microelectronics Corp.
- Semiconductive substrate processing methods and methods of processing a semiconductive substrate30 Jan 2003US 2003/0022076 A1Micron Technology, Inc.
- Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device26 Sep 2002US 2002/0135073 A1Mitsubishi Denki Matsubishi Kaisha
- Structures and structure forming methods20 Jun 2002US 2002/0076620 A1Micron Technology, Inc.
- Manufacturing process for semiconductor device, photomask, and manufacturing apparatus for semiconductor device18 Apr 2002US 2002/0043725 A1Mitsubishi Denki Kabushiki Kaisha
Most cited
By later US patents
- High contrast development of photographic elements81US 4,269,929 AEastman Kodak Company · 1981
- Photographic element comprising an ethyleneoxy-substituted amino compound and process adapted to provide high constrast development50US 4,975,354 AEastman Kodak Company · 1990
- Solid imaging method using compositions containing core-shell polymers46US 5,002,854 AE. I. Du Pont de Nemours and Company · 1991
- Silver halide photographic light-sensitive materials36US 4,323,643 AFuji Photo Film Co., Ltd. · 1982
- Silver halide photographic emulsion32US 4,168,977 AFuji Photo Film Co., Ltd. · 1979